全部 更多 0% 0.02%,过滤除菌,细胞培养适用 0.02%溶液 0.05%/0.02%,溶于pbs,过滤除菌,细胞培养适用 0.05% 0.1%(w/v) in h2o 0.1% 0.1%(w/v) in 5%(v/v) alcohol 0.1% in etoh 0.1%(w/v) in 50% methanol 0.1% in 95% ethanol 0.16% 0.2%,5%ki,澄清过滤 0.25%溶液 0.25%,不含酚红,过滤除菌,细胞培养适用 0.25%,溶于pbs,过滤除菌,细胞培养适用 0.25%,过滤除菌,细胞培养适用 0.25%/0.02%,过滤除菌,细胞培养适用 0.4% 0.40% 0.4% (w/v) in h2o (4 g/l) 0.5% 0.5%水溶液 0.5%(w/v) 0.625% 0.65%溶液 0.75%溶液 0.9%,过滤除菌,无菌无酶,细胞培养适用 0.9%溶液 1.0% 1% 1% crossl. with dvb, 1.0-1.5 mmol/g, 100-200 mesh 1% in 1,2-dichloroethane 1% in h2o 1%,15孔,10*10cm,5mm,5×,mops,rnase free 1%,15孔,10*10cm,5mm,tae 1%,15孔,10*10cm,5mm,tbe 1%,8孔,6*6cm,5mm,5×,mops,rnase free 1%,8孔,6*6cm,5mm,tae,rnase free 1%,8孔,6*6cm,5mm,tae 1%,8孔,6*6cm,5mm,tbe,rnase free 1%,8孔,6*6cm,5mm,tbe 1%交联,30-70目 1%溶液 1%粘度: 700~1500mpa.s, 25℃ 1%粘度: 1501~2600mpa.s, 25℃ 1%粘度: 2601~3400mpa.s, 25℃ 1%粘度: 3401~6000mpa.s, 25℃ 1%(w/w) in h2o 1%pd 1.1% in h2o, surfactant-free, high-conductivity grade 1.3%-1.5% in isopropanol 1.4% in water 1.5% in water(抗静电型) 1.5% in h2o, neutral ph, high-conductivity grade 1.76%(w/v) 2%(w/v) 2% 2% (w/v) in ethanol 2%粘度: 20-30mpa.s 2 % cross-linked with divinylbenzene 2%cross-linked,ca60mesh,8.0meq/g 2%,15孔,10*10cm,5mm,tae 2%,15孔,10*10cm,5mm,tbe 2%,8孔,6*6cm,5mm,tae,rnase free 2%,8孔,6*6cm,5mm,tae 2%,8孔,6*6cm,5mm,tbe,rnase free 2%,8孔,6*6cm,5mm,tbe 2%/2.5% 2%水溶液 2%溶液 2%粘度: 25~150mpa.s, 25℃ 2%粘度:6mpa.s,甲氧基:28-30%;羟丙基:7.0-12% 2%pd 2.5% in h2o 2.5% in etoh 2.5% 3% 3% nh3 in h2o 3%,15孔,10*10cm,5mm,tae 3%,15孔,10*10cm,5mm,tbe 3%,8孔,6*6cm,5mm tbe,rnase free 3%,8孔,6*6cm,5mm,tae,rnase free 3%,8孔,6*6cm,5mm,tae 3%,8孔,6*6cm,5mm,tbe 3%pd 4% (w/v) (40 g/l) in h2o 4% ca 4%,in h2o 4%/0.5% 4%/1% 4%/2.5% 4% 4%多聚甲醛,溶剂:pbs 4%溶液 4.5%(activeoxygen) 4.5%(active oxygen) 5% 5% in h2o 5% in pbs(ph=7.4) 5% w/w乙醇溶液 5%-10% in ethanol, mkseal 5%(v/v) in h2o 5 % 溶液 5% carboxyl basis 5% w/v in ethanol 5% w/v in isopropanol 5%,5%,过滤除菌,无酶 5%, 5%pd 5%水溶液 5%溶液 6%,10孔,1.5mm,玻璃板 6%,15孔,1.5mm,玻璃板 6%(w/v) 6% 0.5m 6%,快速免染,过滤除菌,无酶 6%,快速电泳,过滤除菌,无酶 6%,高清免染,过滤除菌,无酶 6%-8%fe 6% 7%,10孔,1.5mm,玻璃板 7%,15孔,1.5mm,玻璃板 7.5% (w/v), 介质: h2o 7.5% in h2o 7.5% w/w p2o5 7.5%(w/v) in h2o 8%,10孔,1.5mm,玻璃板 8%,15孔,1.5mm,玻璃板 8% (w/v) (80 g/l) in h2o 8%,11孔,1.0mm,塑料板 8%,15孔,1.0mm,塑料板 8%,快速电泳,过滤除菌,无酶 8%,高清免染,过滤除菌,无酶 8% 9%-10%γ-亚麻酸 9% 9% in benzene 10% 10% in h2o 10%,10孔,1.5mm,玻璃板 10%,15孔,1.5mm,玻璃板 10% in triethyl citrate 10%(w/v) in h2o 10% (w/v) in h2o (100 g/l) 10% (w/w) in h2o 10 % 溶液 10% propylene glycol solution 10%w/w in propylene glycol 10% fe 10% in meoh 10% in propanediol 10% w/v in ethanol 10% w/w soln. in thf 10%(w/v) 10%,11孔,1.0mm,塑料板 10%,15孔,1.0mm,塑料板 10%,快速免染,过滤除菌,无酶 10%,快速电泳,过滤除菌,无酶 10%,用于病理实验 10%,过滤除菌,无酶 10%hno3,trace hf 10%pd 10%于水中 10% in water 10%溶液 10%的水溶液,约2.4mol 10%的水溶液 10% nbf 10% pd(oh)2 10% 10% on carbon (wetted with ca. 50% water) 10% pd(55%aq.) 10% w/w乙醇溶液 10% 水溶液 10% in ethanol, 约 0.57mol/l 11.6% 12%,10孔,1.5mm,玻璃板 12%,15孔,1.5mm,玻璃板 12% 12% nbf 12% zr in mineral spirits 12%,11孔,1.0mm,塑料板 12%,15孔,1.0mm,塑料板 12%,快速免染,过滤除菌,无酶 12%,快速电泳,过滤除菌,无酶 12%,高清免染,过滤除菌,无酶 13%于四氢呋喃中, 约0.8mol/l 14% in h2o 14% in water 14% in methanol,mkseal 15%,10孔,1.5mm,玻璃板 15%,15孔,1.5mm,玻璃板 15% 15% mo 15%,快速免染,过滤除菌,无酶 15%,快速电泳, 15%,高清免染,过滤除菌,无酶 15%于四氢呋喃中, 约1.2mol/l 15.3%pt 15.3% pt 16.5%,10孔,1.5mm,玻璃板 16.5%,15孔,1.5mm,玻璃板 19%-21%水溶液 20% (w/w) in h2o 20%-26% in h2o 20% w/v aq. soln. 20% in 1-4% sulfuric acid 20% in c6h5cl 20% in h2o 20% in tetrahydrofuran, mkseal 20% in water 20% pd(oh)2 20% on carbon (wetted with ca. 50% water) 20% solution in etoh, mkseal 20% w/w乙醇溶液 20% w/w in h2o 20% 20%溶液 20%甲醇溶液,~20% in methanol (t) 20%甲醇溶液,~20%inmethanol(t) 20%的苯溶液 20%(v/v) in h2o 20% 甲醇溶液 20%甲醇溶液 20%水溶液 22.5%水溶液 24% (w/v) in h2o 24% in tetrahydrofuran, mkseal 24% in water solution 25%(w/v) 25% in water 25% in h2o 25% (w/w) in h2o, analytical reagent grade 25% in methanol 25% aqueous solution 25% bovine serum albumin, ≥200 units/mg protein (enzyme + bsa) 25% in meoh 25% in isopropanol 25%与二乙烯基苯交联 25%水溶液 25% in water, ca. 2.3mol/l 25% in h2o,mkseal 26.5%diphenyl+73.5%diphenyl oxide 27% 乙酸乙酯溶液 28% in water solution 28%-33% in water 30% 30% (w/w) in h2o, analytical reagent grade 30%-35% in h2o 30% in h2o 30% in water 30% w/w 水溶液 30%,29:1,过滤除菌,无酶 30%,39:1 30%,ph 6.8~8.5(1%溶液) 30%,ph 2~3(1%溶液) 30%inwer 30%水溶液 30% 水溶液 30%甲醇溶液 30%-32.5%活性含量(以edtmp.na计) 31% in h2o 31.5%(ir) 32%,30:2,过滤除菌,无酶 32%溶液 33% in water 33% in h2o, 99% (dry basis) 33% 35% 35% in h2o 35% in water 35% pt basis 35%-39%(以bhmtpmpa计) 35%-40% in water, 模数:3.3-3.5 35%水溶液 36%,固体 36% 37% 38%溶剂油溶液 (6% fe) 38% emulsion in h2o, <0.5 μm particle size 38%-41% 38%溶剂油溶液(6%fe) 40% 40% in water 40% w/w in water 40% (w/w) in h2o, analytical reagent grade 40%(v/v) in h2o(cp) 40% in ethanol,mkseal 40% w/w水溶液 40%甲醇溶液 40% in methanol 40% 2-乙基己酸溶液(8-12% sr) 40% in h2o 40%40%inh2o 40%+ in water 40%inwater 40% 水溶液,即 2.6mol/l 40% 水溶液 40%, contain sodium sulfate 40%,19:1,过滤除菌,无酶 40%,37.5:1,过滤除菌,无酶 40%,澄清过滤 40%,熔点54.0-57.0℃ 40%w/winmineralspirits,6%mn 40% w/w in mineral spirits, 6% mn 40%水溶液 40%溶液,电子级 40%溶液 40% w/w in hexanes 40% w/w 水溶液 40.5%-42.5% pb 43.6%(wt) in dichloromethane 44% 45% fecl3 basis in h2o 45% aqueous solution 45%-50% 活性组分 45%-55% 45% 45%水溶液 45%的水溶液 46% in water 46% 47%水溶液 47%,500-3000 mpa.s 47% 47%-53%(以酸计) 48% bf3, mkseal 48%w/wind2o,99%(isotopic) 48% 49.5%,3%c,过滤除菌,无酶 49.5%,6%c,过滤除菌,无酶 50% 50% in h2o 50% w/w 水溶液 50%水溶液 50%甲醇溶液 50% (w/w) in h2o (760 g/l), analytical reagent grade 50% in dep 50% w/w solution in methanol, mkseal 50% in methanol,safeseal 50% 水溶液 50% in chlorocyclohexane 50% in 1-ethyl-4-methylbenzene 50% in 2-ethylhexanoic acid 50% in dichloromethane 50% in ea 50%?in ea 50% in water 50%水溶液,含磷酸稳定剂≤2% 50% in water (stabilized with 0.1% formic acid) 50% in methanol 50% in triacetin, stabilized 50% in triacetin(α-tocopherol as stabilizer) 50%的水溶液 50% pt basis 50% w/w in aq. soln., reagent grade 50% w/w in h2o 50% w/w 水溶液, 试剂级 50.00% 50% w/w水溶液 50% w/w aq. soln. 50% 麦芽糊精粉末 50% in isopropanol 50% in volatile silicone 50% in xylene 50%(gc,异构体混合物) 50%, 水溶性 50%,from glycine max(soybean) 50%aqueoussolution(99.9%-eu)(reo) 50%inethanol 50% in ethanol 50%inwater 50%w/waq.soln.,reagentgrade 50%w/waq.soln. 50%乙酸锂溶液 50%乙醇溶液(共聚物copolymer,3:7) 50%乙醇溶液(共聚物copolymer,7:3) 50%抗氧剂1010 + 50%抗氧剂168 50%溶液 50.00%水溶液 50%(gc), 异构体混合物 50%邻苯二甲酸二辛酯溶液 50% mixture of isomers,含0.1%tbc稳定剂 50% in ethanol 50%,strength 250% 51% 55% in water 55%, soluble in isobutanol 55%,外消旋和内消旋的混和物 55% 55% mixture of isomers,含0.1%tbc稳定剂 56%ptbasis 56% 8微米 57.5% zn basis (kt) 59% 60% 60% in water 60% in h2o 60%水溶液 60% (mix) 60% in heptane, ca. 1.7 mol/l, mkseal 60%正己烷溶液, ca. 1.7mol/l 60% in heptane,ca. 1.7mol/l,safeseal 60% in heptane,ca. 1.7mol/l 60% in hexane,ca. 1.7mol/l,safeseal 60% in toluene (6-12% cu) 60% in water,300-500ppm mehq 60% 水溶液 60%,gc 60%,水溶液 60%溶液 60%-70% 60%,bs 60%,用于生物染色 60%,0.70~0.80mol/100g,10~25mpa.s 61%min in mineral spirits ,pb 24% 62% 10微米 62% in ethanol 62%-66% in water 62% in methanol 65% 65 % water 65% in h2o 65%,in water 65% in etoh 65% in water 65%,鉴别 65%,lc 70% 70% hf 70% 水溶液 70% in water 70%(含30%甲醇和水) 70% in h2o 70%溶液 70% +(gc) 70% +(hplc) 70% (hplc) 70%(hplc) 70%(gc) 70%, technical grade 70%, 工业级 70%,bs 70%,含异构体和邻苯二甲酸 70%,含稳定剂铜屑 70% (stabilized with copper chip) 70%in water 70%水溶液 70%甲醇溶液 70%的水溶液,约7.3mol 70% in etoh 70% gc 73%,含约20%的2-溴-1-丁醇 73% 74% 75% 75%异丙醇溶液 75% (contains ca. 23% isomer) 75% (dry basis) 75% gc 75% in h2o 75%(hplc) 75%,含稳定剂mehq 75%,含稳定剂mgo 75% (stabilized with mgo) 75% (stabilized with hq) 75%水溶液 75.0%(gc) 75% +(gc) 75.0% 75.00% 75% +(stabilized with mehq) 80% 80% w/w in water 80%(4,5-dcpa≤20%) 80% (in water)(stabilized with mehq) 80%(gc) 80 % in water 80% (contains 5% phenol at maximum) 80% (elemental analysis) 80% (hplc) 80% in ethanol 80% in h2o 80% in water 80% in thf 80% mixture of isomers,含0.1%tbc稳定剂 80% 乙醇溶液 80% 水溶胶 80%(mixture) 80%, mixture of isomers 80%,gc 80%,ind grade 80%,stab.withcalciumcarbonate 80%, 含碳酸钙稳定剂 80%,含175 ppm mehq 稳定剂 80%,含2,6-异构体 80%,天然 80%,natural 80%,用于显微镜 80% for microscopy 80%,用于生物染色 80% w/w in water 80% (gc)(stabilized with mehq) 80.0% 80%乙醇溶液 80%水溶液 80%溶液 80% (stabilized with tbc) 80%-85% 80% +(isomers mixture) 80% gc(stabilized with mehq) 80%(stabilized with mehq) 80% in isopropanol 80%+ w/w in water 81% 82% 83% 83%,gc 83% gc 83% gc(stabilized with hq) 84% 85% 85% (t) 85% in hexamethyldisiloxane 85%(mixtures) 85%, cont. ca 10% 2-cyclohexylidenecyclohexanone 85%,其余物为2-氯代萘 85%,含100ppm mehq稳定剂 85% +(gc) 85%(hplc) 85%,remainder3-bromo-1-butene 85% (stabilized with tbc) 85%(酯含量) 85% +(hplc)(isomers mixture)(≥900ug/mg) 85%反式,10%顺式 85.0%,gc 85% (stabilized with hq&mehq) 85% (contains <5%h2o) 85%(t) 85%, 异构体混合物 85%,gc 85% +(stabilized with mehq) 85% (gc) 85%hplc 85%(gc) 85% +(sds-page) 85% mix tbc as stabilizer 85%(coupling to amines) 85%,stabilized with tbc 86% 87% 87%,顺反异构体混和物 88% 88% (m- and p- mixture)(stabilized with tbc + onp + o-nitrocresol) 88% (stabilized with tbc + onp + o-nitrocresol) 88% +(hplc) 88%(gc) 88.0% 88%, contains 1000 ppm hydroquinone as stabilizer 88.5% (hplc) 89%,含200 - 250 ppm(mehq)稳定剂 89% 89.0% 89.8% 90% 90% mix tbc as stabilizer 90% +(stabilized with tbc) 90%(hplc) 90% gc 90.0% 90% (mixture of isomers) 90%(gc) 90%,5-和6-异构体混合物 90%,用于分子生物学 90%,含碳酸钙稳定剂 90% (stabilized with mehq) 90% +(gc) 90%,工业品 90% (hplc),用于荧光分析 90% (mix) 90% active ingredients basis 90%,stabilized with tbc 90% technical grade 90% tech 90%((cis- and trans- mixture)) 90%,顺反混合物 90%(hnmr) 90%(mixture of isomers) 90%(mixtures), 包含~0.006%对苯二酚稳定剂 90%, 包含对苯二酚稳定剂 90%(nmr) 90%(purity measured on dry basis) 90%(stabilized with mehq) 90%(stabilized with tbc) 90% (stabilized with tbc) 90%(sum of isomers) 90%,异构体混合物 90%(t) 90% (t) 90%(tbc作为稳定剂) 90%(total of isomer) 90%(含≤6%二氯甲烷) 90%(工业级试剂) 90%, mixture of disaccharide 90%, 异构体混合物 90%, 来源于鲨鱼 90%,containing phenylacetonitrile stabilizer 90%,gc 90%,ind grade 90%,lc 90%,nmr 90%,recombinant, expressed in e. coli 90%,remaindermainlytrans,cisisomer 90%,stab. with 0.5% 4-methoxyphenol 90%,stab.with0.5%4-methoxyphenol 90%,t 90%,其余为反,顺-异构体 90%,含100ppm mehq稳定剂 90% +(stabilized with mehq) 90%,含100ppm 氢醌稳定剂 90% (hplc)(stabilized with ~400ppm mehq) 90%,含有10-(4-碘苯基)吩噻嗪的最大值为10% 90%,工业级 90% tech. 90%,异构体的混合物 90%,顺反异构体混和物 90%weightsolutionindenaturedethanol 90%wt, 400mesh 90% (gc) 90% (remainder mainly trans,cis isomer) 90% (stabilized with 200pm mehq) 90% (gc) 90% +(hplc) 90% hplc 90% 混合物 90%,山毛榉木 90%,mixture of isomers 90% contains ~500 ppm phenothiazine as stabilizer 90.0%(mixtures) 90%,stabilized with mehq 90%(hplc)(混旋) 90% (stabilized with silver chip) 90%,stabilized with k2co3 90%, anhydrous, fe 29.5% min 90% stabilized with 60-100 ppm mehq 90%, 含200ppm mehq稳定剂 90% (stabilized with diisopropylethylamine) 90% (stabilizedwith na2co3) 90% (stabilized with na2co3) 90% (10% lactone) 90%,stab.withsodiumcarbonate 90%,溶于水 90% in h2o 90%inh2o 90% +(nmr) 90% (nmr) 90%, technical grade 90%,lc&n 90%水溶液 90%(以干基计) 90.9% 91% 91%,≤10% dichloromethane 92% 92% (stabilized with hq) 92% +(hplc) 92%(cis- and trans- mixture),含稳定剂mehq 92%(gc) 92%,含有稳定剂mehq 92% (mixture of monomer and dimer) 92% (mixture of monomer and dimer) 92% (loss on drying≤5%) 93% 93%(hplc) 93% +(gc) 93.0%(gc) 93% (gc)(stabilized with tbc) 93%(hplc), 还原型 93%,lc 93%,t 93%,含1% caco3稳定剂 93%,含caco3稳定剂 93%,含200 ppm tbc 阻聚剂 93%,含稳定剂吩噻嗪 93% (stabilized with phenothiazine) 93%,外消旋和内消旋混合物 93%,异构体混合物 93% (total of isomer) 93%,黄相 93% gc 93% hplc 93%固含量,5%-7%的甲苯 93% (stabilized with mehq) 93% nmr 94% 94% gc 94% hplc 94%(gc) 94%(hplc) 94%,含0.2% topanol 稳定剂 94%,含mehq稳定剂 94% (wavelength518.0-522.0) 94.0% 94% contains 0.5% potassium carbonate as stabilizer 94%,刺球状,1-3mm 94%,刺球状,3-5mm 95% 95% +(stabilized with tbc) 95% mix tbc as stabilizer 95%mixtbcasstabilizer 95% hplc 95% (stabilized with tbc) 95% +(stabilized with mehq) 95%(hplc) 95%(stabilized with tbc) 95% gc 95%,stabilizedwithtbc 95%(gc) 95 % 95% (hplc) 95% (stabilized with mehq) 95%, contains tbc as stabilizer 95%,99%ee 95.0% 95% (mix) 95% +(stabilized with bht) 95%(tlc) 95%, 50-70 cst 95%, 98 atom % d 95%,异构体混合物 95%endo/exoisomers 95% contains ≤10%h2o 95%,od:1-2 nm,length:4-10 μm,双侧开口 95%,gc&t 95%,含稳定剂铜屑 95%,contains stabilizers,tbc 95%,0-200目 95%,≥200目 95%,颗粒状 95%(7-deaza-dgtp, hplc), ≤4%(7-deaza-dgdp, hplc), solution, 10 mm 95%, mw≥700kda 95%,5-和6-异构体混合物 95%, 含250 ppm mehq 稳定剂 95%,c15-c18 mixture 95% (elsd) 95%, 100mm in h2o 95%,含100ppm mehq稳定剂 95% (stabilized with 200ppm mehq) 95% stabilized 150-200 ppm mehq 95%(stabilized with mehq) 95%,顺反混合物 95% (stabilized with mehq) 95.0%(gc) 95% (stabilized with caco3) 95%,蓝相 95% (stabilized with 0.2% topanol) 95.00% 95% + rel-(1r-4e-ps)-axial 95% (0.01%potassiumhydroxideasstabilizer) 95% (contains <3%h2o) 95%(含有<3%h2o) 95%(contains<3%h2o) 95% (contains <30%h2o) 95% (contains <6%solvent) 95% (contains 25-28%h2o) 95% (contains 30-35%pinacone) 95%,contains30-35%pinacone 95% (contains etoh) 95%(containsetoh) 95% (contains h2o) 95% contains h2o as stabilizer 95%, contains h2o 95% (gc) 95% (h-nmr) 95% (isomers mixture)(contains~15%)(solvent-free) 95% (isomers mixture) 95%, 异构体混合物 95% (stabilized with 1%bht) 95% (stabilized with 5% k2co3) 95% (stabilized with 5%h2o) 95% (stabilized with copper chip) 95%, stabilized with copper chip 95%(stabilizedwithcopperchip) 95% (stabilized with cu) 95% (stabilized with h2o) 95%,stabilizedwithmehq 95% ,stabilized with mehq 95%(stabilizedwithmehq) 95% (stabilized with na2co3) 95%(stabilizedwithna2co3) 95%(tbc作为稳定剂) 95% (tlc) 95% +(0.01% potassium hydroxide as stabilizer) 95%(0.01%potassiumhydroxideasstabilizer) 95% +(contains <10%h2o) 95%(contains<10%h2o) 95% +(contains <2.5%h2o) 95% (contains <2.5%h2o) 95% +(isomers mixture)(~4-6:6-4) 95% +(stabilized with 0.01%k2co3) 95% +(stabilized with caco3) 95% +(stabilized with copper chip) 95% +(stabilized with hq) 95%, stabilized with hq 95% +(stabilized with naco3) 95% (stabilized with tbc) 95%(mixture) 95% stabilized with tbc 95%(stabilizedwithtbc) 95% 1060815-16-8 95% 99%ee 95% anhydrous basis 95% containing less than 10% ea 95% contains ea 95%,containsea 95%gc 95% mix bht as stabilizer 95%,stabilized with tbc 95%混合(tbc作为稳定剂) 95% (mix tbc as stabilizer) 95% mix na2co3 as stabilizer 95% mix50%lioh 95% peg(24) 95% rel-(1r-2e-ps)-axial 95% rel-(1r-4e-ps)-axial 95% stabilized 0.1 % hq 95%stabilized0.1%hq 95%, stabilized 95% stablized with bth 95%(<5%dcm) 95%,dcm<5% 95%(cis- and trans- mixture) 95%(gc), stabilized with mehq 95%(hplc)(t) 95%, 顺反异构体混合物 95%(mix) 95%(mixture of isomers) 95%(nmr) 95%(p2o5:63%±2%,al2o3:17%±1%) 95%(stabilized with bht) 95% (stabilized with bht) 95%(stabilized with copper chip) 95%(stabilized with dcm) 95%(含稳定剂) 95%(stabilized with k2co3) 95% (stabilized with 2%k2co3) 95%(stabilizedwithamylene) 95%(sum of mixtures) 95%(t),含40%十八烷基硫酸钠 95%(含约40%的十八烷基醚硫酸钠) 95%(t) 95.0% (tlc) 95%(γ form + β form) 95%(含水约50%,单位重量以干重计) 95%(含碳酸钾稳定剂) 95%,含碳酸钾稳定剂 95%(异构体混合物) 95%(甲醇溶液) 95%+ 95%, ≤1.0% water 95%, 0.1% 4-甲氧基苯酚稳定剂 95%, 1 mg/ml in methanol:ammonia solution 95%, 10mg/ml in methyl acetate 95%, 15-30 cst 95%, 2.5 wt% in ethanol 95%, 20% in water 95%, 200ppm 4-甲氧基苯酚稳定剂 95%, 250-350 cst 95%, 400mesh 95%, 5mg/ml in buffer solution 95%, 95 atom % d 95%, 98 atom % 13c18 95%, 98%ee 95%, average mn 1250 95%, contains 0.1% hq as stabilizer 95%, in ethanol 95%, mixture of diastereomers 95%, mixture of isomers 95%, mw2000 95%, mw5000 95%, mw10000 95%, mw20000 95%, mw40000 95%, stabilized with bht 95%, total of isomers 95%, wetted with ca. 20% water 95%, ~400mesh 95%, 分子量:10000 95%, 分子量:20000 95%, 分子量:2000 95%, 含k2co3稳定剂 95%, 含有mehq作为抑制剂 95%, 异构体混合物(反式为主) 95%, 非对映异构体混合物 95%,>90%e.e. 95%,(e)+(z) 95%,(双酯≥75%,单酯≥20%) 95%,1m solution in water 95%,200 ppm monomethyl ether hydroquinone as inhibitor 95%,5-10% branched isomers 95%,98%ee 95%,99.9% 95%,drywt.basis 95%,ee 98% 95%,ee98% 95%,ee99% 95%,fe 21% min 95%,gc 95%,in methanol 1 mg/ml 95%,lc&t 95%,lc 95%,mixture of isomers 95%,mw 10000 95%,mw 2000 95%,nmr 95%,stabilized with 60-100 ppm mehq 95%,contains 60-100 ppm mehq as stabilizer 95%,stabilized with mehq 95%,trans-isomer >92% 95%,t 95%,分子量2000 95%,分子量200 95%, 分子量1000 95%, 分子量600 95%,分子量400 95%,含0.2% sodium carbonate 稳定剂 95%,含100-500 ppm tbc稳定剂 95%,含100ppmmehq稳定剂 95%,含200ppm mehq稳定剂 95%,含250ppm bht 稳定剂 95%,含有数量不等的酸酐 95%,含稳定剂mehq 95%,含稳定剂tbc 95%,来源:马链球菌 95%,来源e. coli,lyophilized powder 95%,顺反异构体混和物 95%,stabilizedwithdiisopropylethylamine 95% (stabilized with phenothiazine) 95% nmr 95% (contains <10%h2o) 95% (contains 3-7%nh4cl) 95% (stabilized with 0.5%catechol) 95% (stabilized with 25ppm mehq) 95%,stabilized with 25ppm mehq 95% (stabilized with amylene) 95% contain isomer 95% hplc,n 95% hplc,t 95% mixture of isomers 95% mixture of stereoisomers. 95%(mixture of stereoisomers) 95% rel-(1r-4e-pr)-equatorial 95% titration by naoh 95% t 95%% 95%(mixture of t8,t10,t2) 95%,pde9选择性抑制剂 95%,含0.01% 柠檬酸稳定剂 95%,含0.01 % 柠檬酸稳定剂 95%,牛乳提取 95%,rg 95%,stabilized with copper chip 95%, stabilized with caco3 95%, contains ≤200 ppm bht as inhibitor 95%,含≤3%二氯甲烷 95% metals basis 95%升华品 95%混合物(tbc作为稳定剂) 95%(calc.ondrysubstance,at) 95%containsotherisomers 95.0% (gc) 95.0% (qnmr) 95%(qnmr) 95.0%(total of isomers) 95% (stabilized with 2% 2,6-di-tert-butyl-p-cresol) 95%, 95atom%d 95%, stabilized with mehq 95% average mw 2000 95%(mix-z) 95%, 含有稳定剂mehq 95% (stabilized with mehq or tbc) 95%,3000ppm对苯二酚作为稳定剂 95%stabilizedwithtbc 95% (contains <15%h2o) 95% (contains <17%h2o) 95% (contains <6.5%h2o) 95% (hplc)(contains <10%dmf) 95% (stabilized with hq) 95% +(isomers mixture) 95% gc(stabilized with bht) 95% ≥99%ee,(loss on drying≤2%) 95%,异构体的混合物 95% (stabilized with k2co3) 95%,stabilized with 0.1%potassium carbonate 95.5%(gc) 96% 96% +(stabilized with tbc) 96% mix tbc as stabilizer 96 % 96% gc 96% (stabilized with tbc) 96.0% 96%,片状 96%, 异构体混合物 96% t 96%(酯含量) 96%,5-和6-异构体混合物 96% (stabilized with mehq) 96% +(stabilized with mehq) 96% (gc)(stabilized with ~10%dcm) 96% hplc 96%mixtbcasstabilizer 96%(hplc) 96%, contains mehq as inhibitor 96% + rel-(1r-2e-pr)-equatorial 96% (dry wt.), may cont. up to 8% water 96%(drywt.),maycont.upto8%water 96% (hplc) 96% (isomers mixture) 96% (only trans-) 96% (predominantly (s-)) 96% (tlc) 96%(tlc) 96% +(isomers mixture) 96% ,含80- 120 ppm hydroquinone 稳定剂 96% dry weight,5-10% methanol stabilizer 96% dry weight,5-10% 甲醇做稳定剂 96% hplc,t 96%, contains tbc as stabilizer 96%(cis- and trans- mixture) 96%(gc) 96%(isomers mixture) 96%(mixture of isomers) 96%(mixture) 96%(stabilized with copper) 96%(stabilized with tbc) 96%(异构体混合物) 96%, 98 atom % d 96%, mixture of isomers 96%, mixture 96%, mkseal 96%, stabilized with 100ppm 4-methoxyphenol 96%, 含有200 ppm mehq阻聚剂 96%, 大约200ppm bht 稳定剂 96%,(99% ee) 96%,gc 96%,sum of branched isomer,0.01% mehq 96%,含0.01% mehq 稳定剂 96%,上层覆保护剂 96%,含200 ppm mehq 稳定剂 96%,含250ppmmehq稳定剂 96%,含30 - 70 ppm mehq 稳定剂 96%,含30%水作为稳定剂 96%,含稳定剂铜屑 96%,异构体混合物 96%,混合构型 96%,溶于油 96%,高纯级 96%, 指示剂(ph 11.5-14.0) 96% (contains <15%h2o) 96% pt assay:46.21 ± 1.00% 96%(t) 96% (stabilized with bht or mehq) 96.0 % 96.0% (gc) 96.0% (tlc) 96.0%(gc) 96.00% 96%,stabilized with mehq 96% 99%ee 96%,含0.1% tbc 稳定剂 96%(mixture of tautomers) 96%, contains naco3 as stabilizer 96.5% 96.5%(gc) 96.5% (gc) 97% 97% +(stabilized with tbc) 97% mix tbc as stabilizer 97%(hplc) 97% 99%ee 97 % 97%,99%ee 97%, 99% e.e. 97%mixtbcasstabilizer 97% gc 97.0% 97%, 99%ee 97%,≥99% ee 97% (stabilized with tbc) 97%, 99%e.e. 97%,stabilized with mehq 97% average mw2000 97% (stabilized with mehq) 97% +(stabilized with mehq) 97% average mw10000 97%, average mw 10000 97% average mw1000 97% average mw5000 97%, contains tbc as stabilizer 97%99%ee 97% (mix) 97%,stabilizedwithmehq 97% average mw550 97%(stabilized with tbc) 97% mix-50%e 97%(hplc), 99% e.e. 97%,>99% ee 97% hplc 97% t 97%,stabilized with tbc 97% (hplc) 97%(stabilizedwithtbc) 97%, stabilized with tbc 97% mix-50%z 97%(gc) 97%(hplc), 99%ee 97%, 50% in methanol 97%,gc 97%,含有数量不等的酸酐 97% (99%ee) 97%(99%ee) 97.00% 97%,99% ee 97%(stabilized with bht) 97%,stabilized with bht 97%,含稳定剂tbc 97% (>97%ee) 97% stabilized with copper chip 97% (gc)mix tbc as stabilizer 97% +total of isomer 97%, unsublimated 97%,1μm 97%,片状 97%, 100-200mesh, 0.4-2.0mmol/g 97% >1500u/mg 97% contains 0.5% potassium carbonate as stabilizer 97.0%(t)(hplc) 97% (contains ~5%h2o) 97%(stabilized with cu) 97% (stabilized with naoh) 97% (contains <10%ammonium salt) 97% (stabilized with copper chip) 97%(gc),含300ppmmehq稳定剂 97%, stabilized with mehq 97% (gc)(stabilized with mehq) 97% (gcms) 97% (hplc)mix tbc as stabilize 97% (stabilized with 2%calcium carbonate) 97%(stabilizedwithmehq) 97%(tlc) 97%, water ca 10% 97%,gc&t 97%,mixture of isomers 97%,用于细胞培养 97%,stabilized with hq 97%(d4<0.1%, d5<0.1%, d6<0.1%) 97% mix 97% (isomer mixture) 97.0% (hplc) 97%,stab.withca200ppmbht 97%,含稳定剂2,6-二叔丁基对甲酚 97% (stabilized with k2co3) 97% (stabilized with 200-500ppmmehq) 97 % passes a 75 μm (no. 200) sieve 97 %,200 ppm mehq 97%(nmr) 97%(t) 97%(contains of anhydride) 97% (contains <9-12%h2o) 97% (contains 2-5%dioxane) 97% (hplc)(contains ≤7%ea) 97%,contains≤7%ea 97%,mix 97%(stabilizedwithcopperchip) 97%,stabilizedwithcopperchip 97% (stabilized with hq) 97%(stabilized with hq) 97%, contains mehq as stabilizer 97%,stabilizedwithtbc 97% + 99%ee 97% +((stabilized with mehq) 97% +(contains <0.5%h2o) 97% +(stabilized with caco3) 97%(stabilized with mehq) 97% +(stabilizer with 0.1% alpha-tocopherol) 97% +(t)(drying loss10-15%) 97% +99%ee 97% +stabilized with 30-50ppm 4-tert-butylcatechol) 97% 25-27% solution in ethyl acetate 97% 96%ee 97% 99%ee(contains ~10%solvents) 97% au assay:51.5 ± 1.2% 97% average mw400 97%, average mw2000 97%, average mw5000 97%, average mw1000 97% average mw20000 97% average mw3400 97%, average mw 2000 97%,averagemw2000 97%, average mw 5000 97%, average mw 550 97% 1000 97% average mw 5000 97% average mw6000 97%, stablized with tbc 97%, mix-50%z 97% mixture of isomers 97% mw >50,000 97% rel-(1r-2e-ps)-axial 97% stab. with 0.05% 4-tert-butyl catechol 97%, 0.05%的对叔丁基邻苯二酚作稳定剂 97% ~3% ea 97%(cis- and trans- mixture) 97%, mixtures of c16&c18 97%(hplc)(t)(contains <10%h2o) 97% (hplc)(t)(contains <10%h2o) 97%(mix) 97%(mixture) 97%(mixtureofcisandtrans) 97%(mixtures) 97%(polarpackgasdispensingcylinder) 97%(s)-binapine 97%(stab. with hydroquinone) 97%(stabilized with copper chip) 97%(tbc作为稳定剂) 97%(不能空运) 97%(含200-300ppmmehq稳定剂) 97%(基于干物质)in 25% h2o 97%, (e)+(z) 97%, 100 μg/ml in ethanol 97%, 20 wt. % in h2o 97%, 30-45kda 97%, 4-叔-丁基邻苯二酚 稳定剂 97%, 95 atom % d 97%, mixture of 2- and 4-isomers 97%, mixture of cis and trans 97%, mixture of isomers 97%, mixture of tetramer 97%, moistened with ca 20% water 97%, pd 5%, 铅毒化 97%, stabilized 250 ppm bht 97% stabilized 250 ppm bht 97%, stabilized with 0.5% calcium carbonate 97%, stabilized with 100 ppm tbc 97%, 含0.1% hydroquinone稳定剂 97%, sum of c16 c18 c20 97%, 含0.01% bht稳定剂 97%, 含有稳定剂mehq 97%, 含稳定剂mehq 97%, 异构体混合物 97%, 约含150ppm 4-甲氧基苯酚稳定剂 97%, 颗粒 97%,(hplc) 97%,0.1% 对叔丁基邻苯二酚作稳定剂 97%,10%h2o 97% 10%h2o 97%,10mg/ml solution in water 97%,20%乙二醇甲醚溶液 97%,300目 97%,40-100kda 97%,50% in methanol 97%,ee 99% 97%,ee97% 97%,ee值98% 97%,ee值≥98% 97%,ee≥98% 97%,hq as inhibitor 97%,lc&t 97%,mixture of cis and trans 97% (isomers mixture) 97%,n 97%,pd 10% 97%,stab. with <1% magnesium oxide 97%,stabilized with caco3 97%, 含0.1% koh稳定剂 97%,sum of enantiomers 97%,t 97%,可能以晶形二聚体存在 97%,含 900 ppm mehq 稳定剂 97%,含0.02% 4-methoxyphenol 稳定剂 97%,contains 0.02% 4-methoxyphenol as stabilizer 97%,含0.05% bht 稳定剂 97%,含0.05% 四溴双酚a 稳定剂 97%,含0.1%对叔丁基邻苯二酚(tbc)稳定剂 97%,含100-200ppm bht稳定剂 97%,含100ppmmehq稳定剂 97%,含5% dcm稳定剂 97%,含50ppm bht稳定剂 97%,含60-100ppm bht稳定剂 97%,含cylinderfillcharge 97%,含tbc稳定剂 97%,含不同量的酸酐 97%,含低聚物 97%,含含稳定剂氢醌 97%,含稳定剂hq 97%,含稳定剂mehq 97%,含稳定剂mgo 97%,含稳定剂水滑石 97%,含铜作稳定剂 97%,含铜稳定剂 97%,含铜粉稳定剂 97%,异构体混合物 97%,添加了阻聚剂2,6-二叔丁基对甲酚 97%,用于gc衍生化 97%,铜稳定剂 97%,顺反异构体 97%,顺反异构体混合物 97%,顺反异构体混和物 97%,顺反混合物 97%,顺式 + 反式 97%, 来源于山苍子油 97%,香料级 97%25-27%solutioninethylacetate 97%mixture of cis/trans 97% mixture of cis/trans 97% (stabilized with cu) 97% (contains <17%h2o) 97%, dmso溶解性≥10mg/ml 97%,contains koh as inhibitor 97% (contains ~10%h2o) 97% (contains ≤10%dcm) 97% (stabilized with 0.4% tbc) 97% (stabilized with bht) 97.5%(hplc) 97.5% 97.5% (gc)(stabilized with 400-600ppm tbc) 98% 98% 98%atom%d 98% +(stabilized with tbc) 98% 98atom%d 98%(hplc) 98.0% 98%,99%e.e. 98%, 98 atom % d 98% mix tbc as stabilizer 98% gc 98 % 98%,ee99% 98% 99%ee 98%,99%ee 98% +(stabilized with mehq) 98% 98%atom%13c 98% +98%atom%d 98%mixtbcasstabilizer 98% (stabilized with mehq) 98% t 98% hplc 98%, 99%e.e. 98%(4 times purification) 98%(gc) 98%purity,99%e.e. 98%99%ee 98% (hplc) 98% (stabilized with tbc) 98% 98atom%15n 98%, unsublimated 98%,gc 98%,顺反混合物 98%,stabilized with mehq 98.00% 98% (mix) 98% +(isomers mixture) 98% 98%atom%15n 98% 98.5atom%15n,98.5atom%13c 98%, 99%ee 98% 99atom%15n 98%(metalsbasis) 98%(mixture of isomers) 98%, 99 atom % 13c 98%, mixture of isomers 98%,99% e.e. 98%,t 98%,异构体混合物 98%,顺反异构混合物 98% (stabilized with copper chip) 98% hplc,t 98%(tlc) 98.0 % 98% hplc,n 98% (99%ee) 98%(99%ee) 98% (stabilized with bht) 98%,isomersmixture 98% +(stabilized with amylene) 98% +(stabilized with copper chip) 98%, stabilized with copper chip 98%,stabilizedwithmehq 98% +98%atom%15n 98% +99%ee 98% 95atom%15n 98% 10atom%15n 98% 50atom%15n 98% 97atom%15n 98% trace metals basis 98%(hplc)(t) 98%(isotopic) 98%(mixture of cis and trans) 98%(stabilized with mehq) 98%, 500 μg/ml in ethanol 98%, 99 atom % d 98%, ee 98%,含稳定剂铜屑 98%atomd 98% (contains <5%h2o) 98% n 98%(contains of anhydride) 98% gc,t 98% +(stabilized with hq) 98%,含稳定剂 bht0.3 98% +gc 98% (stabilized with hq) 98%,mixture of isomers 98%,pd>29.0% 98%,stabilized with tbc 98%[catalyst for oxidation] 98%, 异构体混合物 98% +(gc) 98%生物技术级 98%[for redox indicator] 98% (hplc)(contains ≤10%h2o) 98% (purified by sublimation) 98% (isomers mixture) 98%,mkseal 98%,特纯 98%,含100ppmmehq稳定剂 98% +(nmr) 98%(mixtures) 98%,熔点67-72°c 98%,熔点69-72°c 98% stabilized tbc 98% 70% in water 98%,含175 ppm mehq 稳定剂 98%,来源于牛 98% (contains <15%h2o) 98% nmr 98% +(a+b);≥800ug/mg 98% +(stabilized with tbc)(contains3-10%cis- anhydride) 98%(stabilized with tbc)(contains3-10%cis- anhydride) 98%, mix tbc as stabilizer 98%(900-1100ppm mehq as inhibitor) 98%,mixtures 98% +(isomers mixture)(stabilized with 200ppm 4-tert-butylcatechol) 98%,stabilized with phenothiazine 98%,黄相 98%,蓝相 98%(stabilized with copper chip) 98%,约含0.5% mehq 稳定剂 98% (stabilized with monomethyl ether hydroquinone) 98%,stabilized with 0.01%mehq 98%, trans-isomer >95% 98% gc(stabilized with tbc) 98%,contains stabilizers,p-tert-butylcatechol 98% (stabilized with mehq or tbc) 98% containing 3-5% h2o as a stabilizer 98% contains ≤500 ppm sodium carbonate as stabilizer 98%,industrial grade mixtures 98% (contains <10%h2o) 98% (contains 2-3%dcm) 98% (gc)(stabilized with hq or btc) 98% (isomers mixture)(stabilized with mehq) 98% (pnmr) 98% +(contains <10%h2o) 98% +(mix)(contains <16%h2o) 98% +(stabilized with alpha-tocopherol) 98% (stabilized with alpha-tocopherol) 98% +(stabilized with bht) 98% eq:0.74-0.53 98% mixture alfa of isomers 98% technical grade 98%(8m) 98.0% (hplc) 98%,ee92% 98%, ee80% 98% (contains <5% h2o) 98%,ee98% 98%,e.e.%:98% 98%,β-phase basis 98%(at) 98%(chn) 98.0%(hplc) 98%(t) 98.0%(tlc) 98%,stb.with 0.1%bht 98%,植物激素级 98%, ee 98% 98% +(carbon 31.3-33.9%) 98% contains 4% dcm at maximum 98%,stab.with sodium carbonate 98% +(carbon 28.8-31.5%) 98% (isomer mixture) 98%,无脂肪酸 98% +(co 6.65-6.72%) 98% (contains <0.5%h2o) 98%(stabilized with tbc) 98% stab. with 0.05% 4-tert-butyl catechol 98% stabilized hydroquinone 98% (stabilized with copper) 98%,stabilized with 0.1% 3,5-di-tert-butylcatechol 98% (stabilized with 100ppmmehq) 98% +(e>90%) 98%,stabilized 98% water<5% 98% +(contains <2%h2o) 98% +(contains 10-15%h2o) 98% stab. with 300-1000ppm propylene oxide 98%,用于酯化 98% (stabilized with 2-3%mehq) 98%,stabilized with bht 98.1%(isotopic value:99.1%) 98.5% 99% 99%(4 times purification) 99 % 99%(hplc) 99% metals basis 99% trace metals basis 99% (cp) 99%(reo) 99%生物技术级 99.0% 99.00% 99% mix tbc as stabilizer 99%(99.99%-co) 99%(cp) 99%(metalsbasis) 99%,单杂<0.1% 99%,含稳定剂铜屑 99% gc 99% +(gc)(isomers mixture) 99%, sublimed 99%(顺反异构体混合物) 99% suitable for ion pair chromatography 99% +(hplc)(contains <25%h2o) 99% (total of isomer) 99% sublimed 99%,t 99% tlc 99% (stabilized with mehq) 99%,water≤50 ppm (by k.f.), mkseal 99%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99% +(stabilized with 0.01%bht) 99% (stabilized with 0.01%bht) 99.0%(hplc), 升华提纯 99%,50nm 99% 50nm 99% +(mix) 99%,含阻聚剂mehq 99%, neutral 200-300 mesh 99%,中性 100-200目 99%,酸性, 200-300目 99%,含1-3%乙醇稳定剂 99%, with molecular sieves, stabilized with 400 ppm triethylamine, water≤50 ppm (by k.f.), mkseal 99%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99% ar 99% (4.5-6% al basis) 99% 生物技术级 99%,1μm 99% hplc 99%(mixtures), 包含~0.006%对苯二酚稳定剂 99% (mixture of isomers) 99% (mix) 99%,-325目 99%(99.99%-yb) 99%(titration) 99%,含40 - 60 ppm mehq 稳定剂 99%,闪烁级 99%(sum of enantiomers, gc) 99% +(isomers mixture) 99%,stabilized with 100ppm mehq,water≤50 ppm (by k.f.),mkseal 99%(tlc) 99%, 粉末 99%(hplc), 以干基计 99%(含200-300ppmmehq稳定剂) 99 %,stab. with 0.1% tbc 99%(sum of enantiomers, hplc) 99% (stabilized with mgo) 99.3% 99.5% 99.5%(4 times purification) 99.5%(metalsbasis) 99.5% metals basis 99.5% trace metals basis 99.5% (metals basis) 99.5% +(contains <4.5%h2o) 99.5%,water≤50 ppm (by k.f.), mkseal 99.5%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 99.5%,2-3μm 99.5% metals basis,≥200目 99.5% +(contains <25%h2o) 99.5% metals basis,≤45um 99.5% metals basis,5μm 99.5% nanopowder, 21 nm primary particle size 99.5%,30nm 99.5% metals basis,300目 99.5% metals basis, 1-1.5um 99.5% +800m 99.5%(metals basis) 99.5%,100-200nm,球形 99.5% metals basis, 100-200nm 99.5% metals basis,10μm 99.5% metals basis, <50 nm 99.5% metals basis,150-250nm 99.5% metals basis, 50-100nm 99.5% +(stabilized with tbc) 99.6% 99.7% 99.7%,含100ppmmehq稳定剂 99.8% 99.8% metals basis 99.8%,6.35mm (0.25in) dia x 6.35mm (0.25in) length 99.8%,pb:0.001% 99.8%,pb:0.0005% 99.8%,200目 99.8% metals basis,60nm 99.8% metals basis,300目 99.8%, u=0.3%(k=2) 99.9% 99.9% metals basis 99.9%(metalsbasis) 99.9%(reo) 99.9% trace metals basis 99.9% (reo) 99.9% (metals basis) 99.9% trace rare earth metals basis 99.9%(metals basis) 99.9% (purified by sublimation) 99.9% metals basis,2-3μm 99.9% metals basis,2-4μm 99.9%,80-100nm 99.9% metals basis,60-80nm 99.9% metals basis,1~2μm 99.9% metals basis,5~10μm 99.9% metals basis,500nm 99.9% metals basis,<200nm 99.9%(200ppm mehq as inhibitor) 99.9% metals basis,α相,30nm,亲水型 99.9% metals basis,α相,30nm,亲油型 99.9% metals basis, α相, 100nm, 亲油型 99.9% metals basis,200目 99.9%(gc),含40ppm二异丙胺 稳定剂 99.9% metals basis,50nm 99.9% metals basis,30nm 99.9% metal basis 99.9%,2-5um 99.9%,30nm 99.9% metals basis,10μm 99.9% metals basis,1-2μm 99.9% metals basis,颗粒 99.90% 99.95% 99.95% metals basis 99.95% trace metals basis 99.97% 99.97%,300目 99.99% 99.99% metals basis 99.99% trace metals basis 99.99%(metalsbasis) 99.99%metalsbasis 99.99% (reo) 99.99%(reo) 99.99%,粒径:1μm 99.99% metals basis,≤45um,d50:5-6um,(in2o3:sno2~90:10) 99.99% ≤45um,d50:5-6um,(in2o3:sno2~95:5) 99.99% metals basis,325目 99.99% metals basis,γ相,10nm 99.99% metals basis,α相,30nm 99.99% metals basis,晶型α,0.20μm 99.99% metals basis,晶型γ,20nm 99.99% metals basis,α晶型约95%,晶型γ约5%,80nm 99.99% metals basis,α晶型约90%,晶型γ约10%,50nm 99.99% metals basis,α晶型约90%,晶型γ约10%,60nm 99.99% metals basis,80%α相,30nm-50nm 99.99% metals basis,主体晶相,30nm-50nm 99.99% metals basis, γ相, 40nm 99.99% metals basis,α相,30nm,亲水型 99.99% metals basis,α相,50nm,亲水型 99.99% metals basis,α相,300nm,亲水型 99.99% metals basis ,5~6μm,粉末 99.99% metals basis,γ相,20nm 99.99% metals basis,α晶型,60nm 99.99% metals basis,γ晶型,60nm 99.99% metals basis,200目 99.99% metals basis,300目 99.99% metals basis, 40目 99.99% metals basis,粒状,1-3mm 99.99% metals basis,powder 99.995% metals basis 99.995% 99.995% trace metals basis, powder 99.997% metals basis 99.998% metals basis 99.998% 99.9985% (metals basis) 99.9985% metals basis 99.999% metals basis 99.999% 99.999% trace metals basis 99.999% metals basis,200目 99.999% metals basis,≥200mesh 99.999%metalsbasis,1-3mm 99.999% metals basis,粒状,1-3mm 99.999% trace metals basis,powder 99.9999% 99.99999% metals basis,棒状或块状 95+% 98+% ≥98% ≥95% ≥99% hplc≥98% ≥90% 97+% ≥97% >99% ≥98%(hplc) >98%(gc) >97% hplc≥95% ≥98% (hplc) 98 atom % d >98%(t) >95% ≥98%,≥99%e.e. ≥98 atom % d ≥98%(gc) >98% >98%(hplc) hplc≥97% ≥98%,99%e.e. 分析对照品,98% ≥96% >98%(gc)(t) 分析对照品, ≥95%(hplc) ≥97%(hplc) >98%(hplc)(t) >97%(gc) ≥95%(hplc) >95%(gc) 分析对照品, ≥98%(hplc) br,98% 99+% 100µg/ml,5% hno3 ≥98%(gc)(t) ≥98%(t) >98%(hplc)(n) >98.0%(gc) hplc≥96% ≥97% (hplc) ar,99% hplc≥90% ≥95%(gc) ≥98%,≥99% e.e. >97%(t) ≥99%(hplc) >96%(gc) ≥95% (hplc) 分析对照品,>98% ≥97%(gc) >95%(hplc) hplc≥99% ≥95%,99%e.e. ≥98.0% >97%(hplc) 99 atom % 13c 99 atom % d >98%(n) ≥99%(gc) >99% (tlc) ar,99.0% ≥98%(hplc)(t) br,99% ≥90% (hplc) ≥95%,≥99%e.e. >95%(t) 特纯,98% >99%(gc) ≥85% ≥90%(gc) >98.0%(hplc) 100-200 mesh, 1%dvb,substitution 0.3-0.8mmol/g 99 atom % 13c ar,98% ≧95% hplc≥97.5% gc≥98% hplc≥98.5% d,99% >97%(gc)(t) ≥98% (tlc) ≥99.9% >90%(gc) >97.0%(gc) 96+% standard for gc,≥99.5%(gc) ≥90%(hplc) ≥93% ≥98%(lc) >98%(n)(t) 分析标准品,98% >98.0%(t) 98 atom % d, 98%(cp) >99%(t) cp:≥98%;ie:≥98%atomd d:98%;98% ≥70% ≥96%(gc) ≥96%(hplc) ≥98%(t)(hplc) ≥99%(tlc) 强度:100% >85%(gc) >90%(t) >95.0%(gc) >98%(lc) >99.5% 98 atom % 15n 98 atom% d ≥95%(tlc) ≥98.0%(gc) >98.0% >99%(hplc) >99.0%(gc) br,95% >97%(hplc)(t) 98 atom % d, 98% 高纯,98% ar,99.5% d:98.5atom%13c;98% ≥95.0% (hplc) >96%(t) ≥97%(t) ≥98%(n) 丰度:10atom%;化学纯度:≥98.5% 分析对照品,≥98% >90%(hplc) >90% >93%(gc) >93%(t) >94%(gc) >96% >96.0%(gc) hplc≥93% >97%(n) 98 atom% 15n >98%(gc)(n) ar,98.0% dye content 90 % 分析对照品, ≥97%(hplc) ≥80% ≥85% (hplc) ≥92% ≥94% ≥95%(t) >95%(gc)(t) ≥97% (tlc) ≥97.0% ≥98 atom % d, ≥98%(cp) ≥98.0% (hplc) 丰度:99atom%;化学纯度:≥98.5% 分析对照品, 97%(hplc) 100µg/ml,5% hno3 and tr. hf 20 wt. % in h2o >96%(hplc) >97%(hplc)(n) br,97% 98 atom % 13c, 95%(cp) 98 atom % d, 98% (cp) 特纯,99% 特纯,98.5% 99 atom % 13c, 98% (cp) 99 atom% ¹³c 99 atom% 13c ar,98.5% cp,98% cp,98.0% dye content 85% gc≥99% gr,99% hplc≥94% hplc≥96.5% ≥94%(hplc) ≥95%(lc) >95%(hplc)(t) ≥97% (nmr) ≥98 % ≥98 atom % d, ≥98% (cp) ≥98% (hplc), powder ≥98%(hplc)(n) ≥98%(lc&n) ≥98%(lc&t) ≥98%(tlc) ≥98%,99%d.e. ≥98.5% (hplc) ≥98.5% ≥99% trace metals basis ≥99.0% 分析对照品, 98%(hplc) 分析对照品, ≥96%(hplc) 分析对照品,hplc≥98% >80%(hplc) >92%(gc) >95%(lc) >95%(n) >96%(gc)(t) >98%(gc&t) >98.0%(lc&n) >98.0%(n) >99% (hplc) >99.0%(lc) ≥97% ,≥99% ee 含量99%;ee值99% 98 atom % 13c, 98 atom % 15n, 95%(cp) 98 atom % d, 95% 98 atom % d, cp:98% 98 atom % d,98% 98 atom % 15n ≥99.5% 超纯,98% 98atom % d, 98% 99 atom % 13c, 99%(cp) 99 atom % 13c, 99%(cp) 99atom%13c analytical standard ≥97.0% (hplc) d,98% d,99.5% dye content 97 % for hplc, ≥98% gr,99.5% 分析对照品, ≥98% standard for gc, ≥99.5% (gc) tech. 90% ≥85%(hplc) ≥93%(gc) ≥95% (sds-page) ≥95% (tlc) ≥95%(hplc)(qnmr) ≥95%(sds-page) ≥95%(t)(hplc) ≥95.0%(gc) ≥97%(gc)(t) ≥97%(lc) ≥97.0% (hplc) ≥98%(gc&t) ≥98%(hplc)(qnmr) ≥98%(n)(t) ≥98%(t&lc) ≥98%,br ≥98%,gc 99 atom % 13c, 98%(cp) ≥98.0%(hplc) ≥99%(t) ≥99.9% trace metals basis ≥99.99% metals basis 分析对照品,>95% 分析标准品,hplc≥98% >80%(t) >85%(hplc) >90.0%(hplc) >90.0%(t) >92%(t) >94%(t) >95%(lc&t) >95.0%(hplc) >95.0%(lc&t) >95.0%(lc) >95.0%(t) >96%(n) >97%(w) >97.0%(hplc) >97.0%(t) >98%(lc&n) >98%(lc&t) >98%(t&lc) >98%(t)(hplc) >98.0%(gc)(t) >98.0%(hplc)(t) >99%(hplc), sublimed >99%(hplc),sublimed >99.0%(t) >99.5%(lc) (99.9%-ce) (d7, 98%) 0.3~0.8mmol/g, 100~200 mesh, 1% dvb 100µg/ml, 1%hno3 100µg/ml,1%hno3 1000µg/ml, 1%hno3 1000µg/ml,1% hno3 100μg/ml in methanol, 不确定度3% 1000μg/ml in methanol, 不确定度2% 100μg/ml,u=5% 20 wt. % in methanol 20wt.% in methanol 32-36% 34-40%ca 4-12%,10孔,1.5mm,玻璃板 4-12%,15孔,1.5mm,玻璃板 4-15%,10孔,1.5mm,玻璃板 4-15%,15孔,1.5mm,玻璃板 4-20%,10孔,1.5mm,玻璃板 4-20%,15孔,1.5mm,玻璃板 5 wt. % in methanol 50 wt. % in h2o 5?wt.%inmethanol 70+% 8-16%,10孔,1.5mm,玻璃板 8-16%,15孔,1.5mm,玻璃板 8-20%,10孔,1.5mm,玻璃板 8-20%,15孔,1.5mm,玻璃板 >80%(gc) >93%(hplc) 95 atom % d, 95% 95 atom % d, 98% ≥95%, contains tbc as stabilizer 85-90% >95%(hplc)(n) hplc≥92% >96%(hplc)(t) 97 atom % d >97%(n)(t) br,96% ar,97% ≥95.0% >99%(hplc)(t) 98 atom % d, 99 atom % 13c 98 atom % d, 99% (cp) 98 atom % d, 99%(cp) 98 atom % d,96% ar,98%(hplc) purity≥98% ≥99.0%,for ion-pair chromatography 超纯,99% br,98.5% cp,97% usp级,98% 分析对照品, 99% 分析对照品, ≥99% 染色强度100% 98atom% 99 atom% d 高纯,99% >95% >98% analytical standard,98% ar,90% ar,97.0% ar,99.9% cp,98.5% dye content 90 % dye content 95 % dyecontent90% fe2o3≥85% gc≥90% hplc≥80% hplc≥85% 分析对照品,>98% 分析对照品, ≥99%(hplc) pb:59.35~61.36% pt:≥58% ru 35.8-36.1% sn≥42% standard for gc,>99.5%(gc) standard for gc,≥99.0%(gc) tech.85% tech.90% technical grade, 75% ~0.5 m in tert-butyl methyl ether, ≥95% (hplc) ~40% active ingredients in h2o ≥6% ≥75% >75%(gc) ≥80% (hplc) ≥80%(gc) ≥90% (page) ≥90%(hpce) ≥90%(sds-page) ≥90%(tlc) ≥90.0% (hplc) ≥90.0% ≥92.5% ≥93% (hplc) ≥94% (hplc) ≥95% v basis ≥95%(hg) ≥95%(lc&t) ≥95%(n) ≥95%(t)(n) ≥95%,异构体混合物 >95%(w) ≥95.0% (gc) ≥95.0% (tlc) ≥96% (hplc) ≥97 % ≥97%(lc&n) ≥97%(n)(t) ≥97%(n) ≥97.0% (tlc) ≥97.5% (hplc) ≥98 atom % d, ≥99% (cp) ≥98 atom %, ≥98%(cp) ≥98% (hplc), solid ≥98% metals basis ≥98%,含稳定剂mehq ≥98%,顺反异构体混合物 ≥98%,顺反混合物 ≥98.0% (gc) ≥98.0% (nt) ≥98.0% (tlc) ≥99 atom % d, ≥98%(cp) ≥99%,gc ≥99%tracemetalsbasis ≥99.0% (sum of enantiomers, gc) ≥99.5%(gc) ≥99.99% trace metals basis 分析对照品, 96%(hplc) 分析对照品,99% 分析对照品,hplc≥95% 分析对照品,≥98%(hplc) 分析对照品,≥99%(hplc) 分析标准品,≥98% 固含量 48-52% 植物来源:猪苓,甾体类,≥98%(hplc) 粉末,99.9% metals basis > 95% > 98 % hplc, powder > 98% > 99 % hplc, solid >52%(gc) >55%(hplc) >60%(gc) >60.0%(gc) >90%(gc),单脂 >40.0%(gc) >75%(t) >75% >75.0%(gc) 专业级,70% >80% isotactic >80%(n)(t) >80%(nmr) >80.0%(t) >80% >80% >80.0%(gc) >80.0%(hplc) >80.0%(lc) >85%(gc)(t) >85%(t) >85% >85%蛋白,鸡鸭毛来源,分子量小于2000 >85.0%(gc) >85.0%(hplc) >86.0%(lc) >90% (hplc) br,90% 分析对照品, 98% >90% (tlc) >90%(gc),含1000ppmmehq稳定剂 >90.0%(gc) >90%(lc) >90%, mn~40000 >90%,id:0.8-1.6nm,od:1-2nm,length:5-30μm,-cooh:~2.73wt% >75%,od:1-2nm,length:20μm >60%,id:1-3nm;od:2-4nm;length:~50μm ≥95%,id:3-5nm, od:8-15nm, length:0.5-2 μm ≥95%,id:5-10nm,od:10-20nm,length:0.5-2 μm >99.9%,id:5-10nm,od:10-20nm,length:10-30μm,-cooh:~0.6wt% ≥95%,id:2-5nm,od:8nm,length:0.5-2 μm >95%,id:0.8-1.6nm,od:1-2nm,length:5-30um >99.9%,id:5-10nm,od:10-20nm,length:10-30μm,-oh:~0.9wt% ≥95%,id: 5-12nm,od:30-50nm,length:10-20μm ≥95%,直径:60-100nm,长度:5-15μm >60%,id:1-3nm,od:2-4nm,length:0.5-2um,-cooh:~2.6wt% >60%,id:1-3nm,od:2-4nm,length:0.5-2μm,-oh:~2.9wt% ≥95%,od:<2nm,length:5-30μm ≥95%,od:1-2 nm,length:4-20 μm ≥95%,id:5-12nm, od:30-50nm, length:<10um,cooh≥0.7% ≥95%,id:5-12nm,od:30-50nm,length:10-20um,cooh≥2% ≥95%,id: 2-7nm,od:11nm,length:10um ≥95%,id:3-5nm,od:8-15nm,length:50um,-nh2:≥0.45wt% ≥95%,id:3-5nm,od:8-15nm,length:0.2-2um,-oh:≥3.7wt% ≥95%,id:0.8-1.6nm,od:1-2nm,length:5-30um >70%,id: 20-50nm,od: 30-60nm,length: 1-10μm >95%,id:5-12nm,od: 30-50nm,length:10-30um,n:~3 wt% >95%,id:5-12nm,od:30-50nm,length:0.5-2um,n:3.00wt% >60%,id:0.8-1.6nm,od:1-2nm,length:5-30μm,-oh:~4wt% >60%,id:0.8-1.6nm,od:1-2nm,length:5-30μm,-cooh:~3wt% id:5-10nm,od:10-20nm,length:10-30um,ni: >60wt% id:5-10nm,od:20-30nm,length:10-30μm,ni:>60wt% id:5-12nm,od:30-50nm,length:10-20μm,ni:>60wt% id:5-15nm,od:>50nm,length:10-20μm,ni:>60wt% id:3-5nm,od:8-15nm,length:~50um,ni:>60wt% ≥95%,id:0.8-1.6nm,od:1-2nm,length:1-3μm >95%,id:3-5nm,od:8-15nm,length:0.5-2um ≥95%,id:5-10nm,od:20-30nm,length:0.5-2um ≥95%,id:5-12nm,od:30-50nm,length:0.5-2um >95%,id:2-5nm,od:<8nm,length:0.5-2μm,-oh:~5.6wt% >95%,id:2-5nm,od:20-30nm,length:0.5-2μm,-oh:1.8wt% >95%,id:5-12nm,od:30-50nm,length:0.5-2μm,-oh:~1.1wt% >95%,id:5-15nm,od:>50nm,length:0.5-2μm,-oh:~0.7wt% >90%,id:0.8-1.6nm,od:1-2nm,length:1-3μm,-oh:~4wt% >95%,id:2-5nm,od:<8nm,length:0.5-2μm,-cooh:~3.9wt% >95%,id:3-5nm,od:8-15nm,length:0.5-2μm,-cooh:~2.6wt% >95%,id:5-10nm,od:10-20nm,length:0.5-2μm,-cooh:~2wt% >95%,id:5-10nm,od:20-30nm,length:0.5-2μm,-cooh:~1.2wt% >95%,id:5-15nm,od:>50nm,length:0.5-2μm,-cooh:~0.5wt% >90%,id:0.8-1.6nm,od:1-2nm,length:1-3μm,-cooh:~2.7wt% >95%,id:3-5nm,od:8-15nm,length:~50μm ≥95%,id:5-10nm,od:20-30nm,length:10-30μm >95%,id:2-5nm,od:<8nm,length:10-30um >90%,id:5-10nm,od:10-30nm,length:10-30μm >90%,id:5-10nm,od:20-40nm,length:10-30μm >90%,id:5-15nm,od:>50nm,length:10-20μm >90%,od:10-20nm,length:20-100μm >90%,od:100-200nm,length:1-10μm >95%,id:2-5nm,od:<8nm,length:10-30μm,-oh:~5.6wt% >95%,id:3-5nm,od:8-15nm,length: ~50μm,-oh:~3.7wt% >95%,id:5-10nm,od:10-20nm,length:10-30μm,-oh:~3.1wt% >95%,id:5-10nm,od:20-30nm,length:10-30μm,-oh:~1.8wt% >95%,id:5-12nm,od:30-50nm,length:10-20μm,-oh:~1.1wt% >90%,id:0.8-1.6nm,od:1-2nm,length:5-30μm,-oh:~4wt% >95%,id:5-15nm,od:>50nm,length:10-20μm,-oh:~0.71wt% >60%,id:1-3nm,od:2-4nm,length:~50μm,-oh:~3wt% >95%,id:5-10nm,od:10-20nm,length:30-100μm >99.9%,id:3-5nm,od:8-15nm,length:~50μm >99.9%,id:5-10nm,od:10-20nm,length:10-30μm >99.9%,id:5-10nm,od:20-30nm,length:10-30μm >99.9%,id:3-5nm,od:8-15nm,length:~50μm,oh:~1.85wt% >99.9%,id:5-10nm,od:10-20nm,length:10-30μm,-oh:~1.53wt% >99.9%,id:5-10nm,od:20-30nm,length:10-30μm,-oh: ~0.88wt% >99.9%,id:5-12nm,od:30-50nm,length:10-20μm,-oh:~0.5wt% >99.9%,id:5-15nm,od:>50nm,length:10-20μm,-oh: ~0.4wt% >99.9%,id:3-5nm,od:8-15nm,length:~50μm,-cooh:~1.3wt% >99.9%,id:5-10nm,od:10-20nm,length:10-30μm,-cooh:~1.0wt% >99.9%,id:5-10nm,od:20-30nm,length:10-30μm,-cooh:~0.61wt% >99.9%,id:5-12nm,od:30-50nm,length:10-20μm,-cooh:~0.4wt% >99.9%,id:5-15nm,od:>50nm,length:10-20μm,-cooh: ~0.3wt% >95%,id:2-5nm,od:<8nm,length:10-30μm,-cooh:~3.9wt% >95%,id:3-5nm,od:8-15nm,length:~50μm,-cooh:~2.6wt% >95%,id:5-10nm,od:10-20nm,length:10-30μm,-cooh:~2wt% >95%,id:5-10nm,od:20-30nm,length:10-30μm,-cooh:~1.2wt% >95%,id:5-15nm,od:>50nm,length:10-20μm,-cooh:~0.49wt% >60%,id:1-3nm,od:2-4nm,length:~50μm,-cooh:~2.6wt% >90%,id:0.8-1.6nm,od:1-2nm,length:5-30μm >90%,od:8-15nm,length:30-50μm >60%,od:id:0.8-1.6nm,1-2nm,length:5-30um >90%,id:0.8-1.6nm,od:1-2nm,length:1-3um >60%,id:1-3nm,od:2-4nm,length:~50um >95%,id:5-10nm,od:10-20nm,length:10-30um >95%,id:5-10nm,od:10-20nm,length:0.5-2um >99.9%,id:5-12nm,od:30-50nm,length:10-20um >95%,id:0.8-1.6nm,od:1-2nm,length:5-30μm,oh:~7.0wt% >95%,id:0.8-1.6nm,od:1-2nm,length:1-3μm,-oh:~9.0wt% >60%,id:0.8-1.6nm,od:1-2nm,length:1-3μm,-oh:~3.96wt% >95%,id:0.8-1.6nm,od:1-2nm,length:5-30μm,-cooh:~9.0wt% >95%,id:0.8-1.6nm,od:1-2nm,length:1-3μm,-cooh:~13.0wt% >95%,id:0.8-1.6nm,od:1-2nm,length:1-3μm,-nh3:>0.5wt% 水分散液,0.15wt% 异丙醇溶液,2- 3wt % 乙酸乙酯溶液,2- 3 wt % 二甲基甲酰胺溶液,2- 3 wt % >60%,id:0.8-1.6nm,od:1-2nm,length:1-3μm,-cooh:~2.73wt% >60%,id:1-3nm,od: 2-4nm,length:0.5-2 um 纯度:99.9% 直径:150-200 nm(从hrtem、raman) 长度: 10 - 20微米(透射电子显微镜) 长径比:70 石墨化:> 80% 导热系数:k>1600w/mk 面积:300平方米/克(bet) 导热系数:~ 2000 w/m 热膨胀系数:1.0ppm /℃ 体积密度:0.18g/ cm3 ~真密度:2 g/cm3 >90%,id:70-80nm,od:90-100nm,length:<10um >90%, id:30nm, od:40nm, length:<10μm >90%, id:50nm, od:60nm, length:<10μm >90%, id:60nm, od:70nm, length:<10μm id:5-10nm,od:20-30nm,length:<10μm,ni:>60wt%,c:>38wt% 浮动催化 purity:>95wt% od:<2nm length:5-30 μm ssa:>640 m2 /g 浮动催化 purity:>95wt% od:<2nm length:5-30 μm purity:>60wt% id:1-3nm od: 2-4nm length: ~50μm ssa: >340m2 /g purity:>60wt% -oh content: 2.92wt% id:1-3nm od: 2-4nm length: ~50μm ssa: >350m2 /g purity:>60wt% -cooh content: 2.58wt% id:1-3nm od: 2-4nm length: ~50μm ssa: >350m2 /g purity:>95wt% id:3-5nm od: 8-15nm length: ~50μm ssa: >140m2/g purity:>98wt% -oh content:1.06wt% id:5-12nm od: 30-50nm length: <10μm ssa:>100 m2/g purity:>99wt% id:2-5 nm od: 5-15nm length: 10-30μm ssa:220-300 m2/g purity:>98wt% id: 5-10nm od: 20-30nm length: 0.5-2μm ssa: >120m2 /g purity:>98wt% id: 5-12nm od: 30-50nm length: 0.5-2μm ssa:>100m2 /g ≥95%,od:<2nm,length:0.3-5μm, 移动催化法 ≥95%,od:1-2nm,length:5-30um, 浮动催化 ≥55%,od:<2nm,length:5-30μm ≤5%金属催化剂 ≥90%, id:2-5nm, od:<8nm, length:10-30μm ≥95%, od:30-80nm, length:0.5-2μm ≥95%, od:20-30nm, length:10-30μm ≥95%, od:<11nm, length:5-15μm ≥95%, od:10-20nm, length:10-30μm ≥95%,id:5-10nm,od:20-40nm,length:1-2 μm ≥50%,od:<5nm,length:<50μm ≥95%,od:5-15nm,length:0.5-2um ≥95%,od:30-80nm,length:0.5-2um ≥95%,id:5-12nm,od:30-50nm,length:0.5-2μm,-cooh:~0.8wt% ≥95%,id:5-10nm,od:10-20nm,length:0.5-2μm,-oh:~3.1wt% ≥95%,id:3-5nm,od:8-15nm,length:0.5-2μm,-oh:~3.7wt% ≥95%,od:1-2 nm, length:4-20μm, ni≤1ppm ≥95%,od:2-5nm, length:5-15μm, ni≤1ppm ≥95%,od:10-20nm, length:10-30μm, ni≤1ppm ≥95%,od:8-15nm, length:10-30μm, ni≤1ppm ≥98%,od:30-80nm,length:<10μm,-oh:~0.77wt% ≥90%,od:10-20nm,length:5-20μm ≥90%,od:3-8nm,length:0-10μm ≥95%,id:5-15nm,od:30-80nm,length:<10μm ≥90%,id:5-15nm,od:30-80nm,length:<10μm ≥90%,id:5-10nm,od:20-40nm,length:10-30μm ≥90%,id:5-10nm,od:10-30nm,length:10-30μm ≥90%,id:5-15nm,od:>50nm,length:10-20μm ≥90%,od:10-30nm,length:10-30μm ≥90%,od:20-40nm,length:10-30μm 9-10wt % 7-8wt % 9.5-12.5 wt %, od:40-60nm, length≤10μm 0.8-1 wt %, od:1-3nm, length:1-2μm 9.5-12.5 wt %, od:30-80nm, length≤10μm 0.2 wt% 4.5-5.5 wt% >90%,乙腈溶液 90+% 试剂级,95% 100μg/ml,u(%)=2,介质:乙醇 ar,85% >90.0%(lc) >90.0%(n) >90%(n) >92%(hplc) >92% >93%(n) β-form,98% >93.0%(gc) >93.0%(hplc)(t) >93%(hplc)(t) >93.0%(hplc) >93.0%(lc),顺反混合物 >93.0% 93+% >93% >94% >94.0%(gc) >95% (sds-page), ≥100 units/mg protein >95.0%(gc), 含稳定剂bht 10mg/ml;≥95%(hplc) >95%(lc-ms) >95%(t),mixture 62.0~68.0 w/w% >95%, 含稳定剂bht 80+% >95.0%(gc&t) >95.0%(gc)(t) >95.0%(gc),异构体混合物 >95.0%(hplc)(n) >94%(hplc) >95.0%(n) >95.0%(t),硬型,混合物 ar,70% >95.0% >96%(gc&t) >96.0%(gc),stabilized with hq >96.0%(gc),含0.1% tbc稳定剂 >96.0%(lc&n) >96%(hplc)(n) >96.0%(lc&t) >96.0%(t) >96.0% >96.5% >97% (sum of isomers, gc) >97%(gc&t) >97.0%(n) >97%(t&lc) ≥99.5%(4 times purification) >97%, 含稳定剂tbc >97.0%(gc&t) >97.0%(gc) ,含500ppm tbc稳定剂 >97.0%(gc)(t) >97.0%(gc),含50ppm tbc稳定剂 >97%(gc),含50ppm tbc稳定剂 >97.0%(gc),含稳定剂铜 >97.0%(hplc)(n) >97.0%(hplc)(t) >97.0%(lc&t) >97.0%(lc) >97.0%,total of isomer >97.0% 分析对照品, ≥99.5%(gc) >97.5% >98% usp >98% 生物技术级 ≥99%(hplc), 冻干粉 >98%(gc&n) >98%(gc) , 含铜作稳定剂 >98%(gc)(stabilized with hq) >98%(gc),contains <1% butyl mercaptan as stabilizer ≥98%,含稳定剂丁基硫醇 >98%(hplc), sublimed >98%(hplc),sublimed >98%(hplc), unsublimate >98%(t)(gc) ≥98%(t)(gc) ≥98%(t), 低含水量 >98%,>98%ee >98%,hiv蛋白酶抑制剂 100μg/ml in methanol, uncertainty 3% 1000μg/ml in methanol, uncertainty 2% color value 30 (e1%,1cm,5) dye content ~85 % dye content:85 % hplc≥91.4% ≥95% (lc/ms-elsd) ≥96.5%(hplc) >98.0% (gc) standard for gc,>99%(gc) >98.0%(gc&t) >98.0%(gc),含100ppm环氧丙烷稳定剂 >98.0%(hplc)(n) >98.0%(hplc)(w) >98%(hplc)(w) >98.0%(lc),含≤5%的二氯甲烷 >98.0%(lc) >98.0%(n)(t) >98.0%(t&lc) >98.0%(t)(hplc) >98.0%(t)(n) ~41% in h2o (t) >98.0%(w) for ion-pair chromatography,98% >98.5%(gc) 1.00mg/ml u=2% 基质:正己烷 gc>99.5% >98.5%(hplc), sublimed >99 % (hplc), sublimed >99% (gc) >99% (hplc), sublimed ≥99%(hplc), 异构体混合物, 用于有机电子 ≥99.5%, 用于有机电子 >99% (lpa; may contain up to 10% of the 2-lpa isomer) >99% (lpa; may contain up to 10% of the 2-lpa isomer, tlc) >99% (lpc; may contain up to 10% of the 2-lpc isomer, tlc) >99%(gc)(t) >99%(gc),包含180-200 ppm mehq 稳定剂 >97%(gc),包含180-200 ppm mehq 稳定剂 >99%(hplc), sublimed >99%(hplc),?sublimed 试剂级,98% >99%, ee >98% >99%,100%ee >99%,升华提纯 分析对照品, ≥90%(hplc) ≥95%(sum of isomers, hpce),用于荧光分析 ≥96%(tlc) >99.0% (gc) 1.00mg/ml u=2%基质:甲醇 >99.0% 生物技术级 >99.0%(gc) ,含100ppm 4-叔丁基邻苯二酚稳定剂 >99.0%(gc)(t) >99.0%(gc),含mehq稳定剂 分析标准品,≥99.5%(gc) standard for gc,≥99.5% (gc) standard for gc, ≥99.5% spectrophotometric grade, ≥99% 分析标准品,≥99.7%(gc) 分析对照品,≥99.5% >99.0%(hplc) >99.0% >99.5% (gc) >99.5%(gc) standard for gc, ≥99.7%(gc) 分析对照品,99.8% >99.5%(hplc) >99.6%(hplc) >99.998% <1% diethylene glycol monobutyl ether <5% gc isomers (hplc) ((4-6% 巯基丙基)甲基硅氧烷) - 二甲基硅氧烷共聚物,120-170 cst (0.05%/0.5%) in water (10-20%)[用于酯化] (5-10%)[用于酯化] (99.9%-er)(reo) (99.9%-y)(reo) (99.99%-ce) (reo) (99.99%-ce)(reo) (99.99%-in) (99.99%-sc)(reo) (99.9999%-ga) (d, 99%) dcl 20% in d2o (d, 99%) dcl 36.5% in d2o (d, 99%) (d, 99.5%) (<5% d2o) (d, 99.5%) dcl 20% in d2o (d, 99.5%)+ 0.03% v/v tms (d, 99.5%) (d, 99.96%) (d,99%)(<6% d2o) (d,99%) (d,99.5%) +0.03% v/v tms (d,99.5%) (d,99.5%) + 0.05% v/v tms (d,99.8%)(0.03% v/v tms) (d,99.8%) (d,99.9%) + 0.03 % (v/v) tms (d,99.9%) (d,99.96%)(+0.03% v/v tms) (d2, 98%) (~5% d2o) (d3, 98%) (d3, 99%) (dhqd)2phal:0.552% (e)+(z),98% (mixture of 3- and 4-isomers) stabilised with 4-tert-butylpyrocatechol for synthesis: ≥ 98.0 % (a/a) (no2-)10.0ug/ml,(no3-)100.0ug/ml,基质:水, u(%)=2 (synthetic)(drying loss:max. 25.0 %)(absorbance(e1%1cm)min. 300(meoh, 579.0 to 583.0 nm)) (含二氧化硫标液1支100μg/ml、20ml/支,甲醛吸收缓冲液1支20ml/支、盐酸付玫瑰苯胺2支0.05g/100ml、氨基磺酸钠1瓶0.60g/支)基质:水.u=1% (顺式+ 反式), ≥92%(gc) -100 目, 99.9% metals basis -200目,97% 1-10 μm,98% -325 目, 99.5% -325目,99.99% (metals basis去除ta), ta <500ppm 0.127mm (0.005in) 厚, 退火, 99.8% (metals basis) -325目粉,99.0% metals basis ≤45um,99.0% metals basis -325目粉,99% metals basis 6-14% active chlorine basis available chlorine 5.5~6.5% 有效氯:7.5%,游离碱含量:0.1-1% available chlorine 4.0 % 有效氯 13%~16% 有效氯 ≥30% 有效氯 ≥20% 0.100 mg/ml in methanol, u=4% 0.1017mol/l, 基质:水 u=0.2% 100μg/ml,u=4%,介质:石油醚 10μg/ml,u=7% synthetic, 98% 0.1mm (0.004in) 厚 x 43.8mm (1.72in) 宽, 99.997% metals basis 0.1mm 厚, 99.9% metals basis 0.1mm 厚, 99.99% metals basis 0.1mm,99.9% metals basis 0.1mm, 99.999% metals basis 500μg/ml, 5% hno3 0.1mm,99.99% metals basis 10μg/ml, 5% hno3 0.2μg/ml, 5% hno3 1.5μg/ml, 5% hno3 0.15μg/ml, 5% hno3 分析标准品,99.95% 0.2 mm,99.9% metals basis 0.2 mm,99.99% metals basis 0.25mm 厚, 99.994% metals basis 2.0mm 直径, 99.999% metals basis 0.25mm 直径, 99.99% (metals basis 去除 ta) 0.25mm 直径, 退火, 99.9% metals basis 超干, 99.9% metals basis 100-200 mesh, 1% dvb,0.5-2.5mmol/g 0.516m(水溶液),纯度≥98% 无水级, 99.99% metals basis 0.5mincyclohexane,10-12wgt% ≥99%, 4-16mesh fe:21.0-23.0% ar ≥99%,tcep,无酶 0.5ng/ml,1.0ng/ml,3.0ng/ml,5.0ng/ml,基质:2%硝酸,u=2% 0.5wt%la, 300目 0.5wt%la, 300目,氧含量<1000 ppm 0.5μg/ml,1.0μg/ml,3.0μg/ml,5.0μg/ml,基质:2%硝酸,u=1% 0.8-12mm (0.03-0.47in), 99.98% (metals basis) acs, ≥98.0% (rt) 1 μm,98.5% ~1 μm, 98% 100-200 mesh, extent of labeling: ~3.0 mmol/g loading, 2 % cross-linked with divinylbenzene 1 mg/ml in methanol (:aqueous 10 mm nh4oh (7:3)), ≥90% (tlc) 1 mg/ml in methanol (:aqueous 10 mm nh4oh (7:3)), ≥95% (tlc) 1×10-4g/ml,u=2% 基质:甲醇 1×10-5g/ml,u=2% 基质:甲醇 1×10-6g/ml,u=3% 基体:高氯酸 1×10-7g/ml,u=2% 基质:甲醇 1×10-9g/ml,u=3%基体:高氯酸 1-2μm,99% metals basis,powder powder,1-2 μm,99% 1-3μm, ≥99% metals basis 20~30 nm 粒径, 30 wt. % 异丙醇溶液 20~30 nm 粒径, 30 wt. % 水溶液 20-30nm,99.99% metals basis 40-50nm, ≥99.95% metals basis 8-15nm, ≥99.95% metals basis for hplc,≥99.0% for molecular biology,98% for lc-ms,≥99.0% -22 目,99.999% (metals basis) powder,99.99% metals basis 1.00mg/ml u=2% 基体:正己烷 1.00mg/ml 基质:水 u=1% 1.00mg/ml 基质:水 u=1.5% 100μg/ml,u=2%,介质:乙酸乙酯 10μg/ml,u=2% 分析标准品,99.5% for insect cell culture,≥99.0% 1000μg/ml in acetonitrile, 不确定度2% 10μg/ml,u=4% 10μg/ml,u=6% standard for gc,≥99.8%(gc) br,85% acs,97%,片状 ≥98%,pellets(anhydrous) ≥96%, n≤0.0005% ar,1% in h2o ar,5% in h2o ar,3% in h2o 电子级, 99.9% metals basis 1.0~1.24mmol/g ,100~200 mesh,1% dvb 1.3-1.7% in water 1.3 wt % dispersion in h2o, conductive grade 2.7 wt % dispersion in h2o, low-conductivity grade 10 wt% in hexanes 10 wt. % in h2o 10 wt.% in 10 wt.% nitric acid, 99.999% trace metals basis 10 wt.% in propylene glycol >99.0% 电泳级 bioreagent plus, ≥98% 10 wt. % in methanol 10 wt.%inmethanol 20 wt. % in methanol 10-80% ≥60%(gc) ≥40%(gc) ≥97%(at) (ca. 50% in diethyl phthalate) ~50%邻苯二甲酸二乙酯溶液 100 μg/ml, u=2%, 用于水质分析 100 目, 99.9% metals basis 100µg/ml, 1% hno3 100µg/ml, 5% hno3 100µg/ml,1% hno3 1000µg/ml, 10% hno3 1000µg/ml, 5% hno3 1000µg/ml,1.0 mol/l hno3 and 0.1% hf 100µg/ml, 0.1%hf 1000µg/ml,5% hno3 1000µg/ml,2% hno3 1000µg/ml,10% hno3 100µg/ml,2% hno3 1000µg/ml, 5%hno3 500µg/ml,1%hno3 100 mg/l, 基体: 5% hno3 100µg/ml,3% hf 100µg/ml,3% hno3 100µg/ml,5% hno3 and tr. tartaric 100µg/ml,5% hno3 ,含k+ 1.36mmol/g,100~200mesh,1%dvb 100-200 mesh,1% dvb,0.3-0.8mmol/g 0.3~0.8mmol/g,100~200mesh,1%dvb 100-200 mesh,1% dvb,0.3-2.0mmol/g 100-200 mesh,1% dvb,0.4-3.0mmol/g 30 nm 粒径, 20 wt. % 异丙醇溶液 5-10 nm 粒径, 20 wt. % 水溶液 ≥92%,80-150目,碱性 ≥92%,80-150目,中性 ≥92%,80-150目,酸性 100 nm 粒径, 20 wt. % 异丙醇溶液 20nm-100nm,99.9% metals basis 1.0mm 直径, 退火,99.995% metals basis 5mm 直径,99.999% metals basis 1.0mm 直径,99.999% metals basis 1-3mm (0.04-0.1in),99.9997% (metals basis) 100μg/ml in hexane, uncertainty 3% 1000μg/ml in hexane, uncertainty 2% 100μg/ml in acetonitrile, 不确定度3% 分析标准品,95% 分析对照品, ≥95% 3 wt. % in h2o 6 wt. % in h2o ≥98%(mixture of isomers) 1000μg/ml in acetonitrile, uncertainty 2% 1000μg/ml in acetonitrile,uncertainty 2% 1000μg/ml 以bro3-计, 基质:水 u=0.6% 1000μg/ml 基质:水 u=1% 1000μg/ml 基质:水 u=0.5% 1000μg/ml,基体:10%hno3 0.62mm 厚, 99.9% (reo) 1-1.5mm 厚, 保存在石蜡油里, 99.9% (reo) 1000μg/ml,2%hno3(v/v) 1000μg/ml,u=3%, 基体: h2o 100μg/ml,u=3%, 基体: h2o 10μg/ml、100μg/ml、10μg/ml、200μg/ml、200μg/ml、50μg/ml、10μg/ml,u=3%, 基体: h2o 500μg/ml,u=3%, 基体: h2o 0.1μg/ml、2μg/ml、1μg/ml、1μg/ml、2μg/ml,u=3%, 基体: h2o 322μg/ml、1.85μg/ml、27.6μg/ml、306μg/ml,u=3%, 基体: h2o 5μg/ml、8μg/ml、8μg/ml、40μg/ml,u=3%, 基体: h2o 2μg/ml,u=3%, 基体: h2o 1000μg/ml,u=5%, 基体: h2o 100μg/ml,u=5%, 基体: h2o 200μg/ml,u=3%, 基体: h2o 1000μg/ml,u=2%, 基体: h2o 50μg/ml、50μg/ml,u=3%, 基体: h2o 200μg/ml、50 μg/ml,u=3%, 基体: h2o 22mm (0.9in) 直径, 99% (metals basis), sr ≤0.8% 1000µg/ml,溶剂:10% hno3 ar,98%,含3%乙醇稳定剂 acs,99.0-100.5% ≥40% ar,99.0%,含40ppm二异丙胺 稳定剂 ≥99.0% (hplc) φ5mm 高2.5mm 圆柱体,ge≥99.999% -100 目, 99.999% (metals basis) gmp grade,≥99%,100mm 100ug/ml, 5% hno3 100ug/ml, u=2%基体:甲醇 for plant cell culture,98%(hplc) 99 atom % 13c, 97%(cp) d:98%;95~98% 98 atom % d, cp:95% 100~200 mesh, 1% dvb,0.3~0.8mmol/g 100μg/ml 基质:水.u=5% 37 wt. % in h2o,含10-15% 甲醇稳定剂 18 wt. % in h2o,含5-8% 甲醇稳定剂 28 wt. % in h2o, 含10-12% 甲醇稳定剂 分析标准品,97% 10μg/ml,u=3% 10μg/ml,u=5% 分析对照品,≥99% cp:98.86%,ie:99.61%d/molecule cp:98.34%,ie:99.51%d/molecule cp:98.7%,ie:99.56%d/molecule cp:98.74%,ie:99.56%d/molecule cp:98.85%,ie:99.85%d/molecule cp:99.02%ie:99.90%d/molecule cp:99.9%;ie:98.58%atomd cp:99.90%;ie:98.58%atomd cp:96.83%ie:98.28%d/molecule 100μg/ml in hexane, 不确定度3% 1000μg/ml in hexane, 不确定度2% cp:≥99.45%;ie:≥97.62%atomd cp:99.45%ie:97.62%d/molecule 100μg/ml in acetonitrile, uncertainty 3% cp:98.55%;ie:97.81%d/molecule cp:99.00%,ie:97.79%d/molecule cp:≥99.10%;ie:≥98.5%atomd cp:≥99.22%;ie:≥99.11%atomd ≥89% 分析标准品,99% 分析对照品, 94% 分析对照品,97.5% 100μg/ml u=3% 基质:正己烷 100μg/ml, u(%)=2 , 介质:异丙醇 分析对照品, ≥98%, 异构体混合物 100μg/ml, u(%)=2 , 介质:苯 100μg/ml, u(%)=2 100μg/ml, 介质:0.01% naoh水溶液 100μg/ml,u(%)=2,介质:丙酮 100μg/ml,u(%)=2,介质:正己烷 100μg/ml,u(%)=2,介质:甲醇 100μg/ml,u(%)=4基体:石油醚 100μg/ml,u=2%, 100μg/ml,u=2%,介质:异丙醇 100μg/ml,u=2%,介质:正己烷 100μg/ml,u=2%,介质:水 10μg/ml,u=% ,溶剂:水 100μg/ml,u=2%,介质:甲醇 10μg/ml in methanol,u=2% 10μg/ml,u=2%,介质:甲醇 高纯,95% 100μg/ml,u=2%,基体:石油醚 100μg/ml,u=3%,介质:乙酸乙酯 100μg/ml,u=3%,介质:乙醇 100μg/ml,u=3%,介质:甲醇 100μg/ml,u=3%,基体:石油醚 10μg/ml,u=5%,基体:石油醚 10μg/ml,u=7%,基体:石油醚 100μg/ml,u=3%.介质:甲醇 100μg/ml,u=3%.石油醚 100μg/ml,u=3% 100μg/ml u=3% 基体:苯 10μg/ml in methanol, u=4% 100μg/ml,u=4% 介质:石油醚 10μg/ml,u=6% 介质:石油醚 100μg/ml,u=4%,基体:正己烷 10μg/ml,u=5%,基体:正己烷 100μg/ml,u=4% 100μg/ml,u=5%,介质:石油醚 100μg/ml,u=5%,基体:甲醇 10μg/ml,u=7%,基体:甲醇 10μg/ml,u=6% 介质:石油醚 100μg/ml,基体: 1% hno3 100μg/ml,u=4% ,,溶剂:石油醚 10μg/ml,u=6%, 溶剂:石油醚 分析对照品,≥99.8%(gc) 100目,99.9% 100 mesh, 99.9% metals basis 100 mesh,99.9% 10mg/ml in 0.9% nacl solution 16.27 mm in 0.9% nacl mixture of isomers, ethanol solution, ≥97%(gc) ≥98%, a solution in methyl acetate 10mm,95% 10ng/ul,u(%)=2,介质:无水乙醇 10wt% in heptanes 10wt% in hexanes 10wt.% in hexane,mkseal 100μg/ml,ur=3%,基质:甲醇 10μg/ml 基质:水 u=2% 10μg/ml in methanol, 不确定度6% 10μg/ml, u=3%, 基质: 甲醇 ~6% zr in mineral spirits 12+% 12.0-14.5% fe basis 12.5-13.5% fe basis 填料级,白度≥75% 13-14% active oxygen 14.5 - 16% wt.% 磷 15-18%(nitrogen) 15-20 wt. % in h2o, ≥99.99% trace metals basis 15wt.% in h2o 16-20%inwater 165μg/ml 基质:水 u=1% 17-23%钒 18 wt% in dimethylbenzene 18 wt%二甲苯溶液 18nm,18 wt% 30nm,18 wt% ≥99.5% (metals basis) 19-23% ce basis 19mm 或更小, 99% metals basis 1.0 m solution in thf, containing ca. 5% h2o 70-75% w/w aq. soln bs,85% bs,60% 电泳级,80% 2 wt. % in h2o mixture of cmi and mi,1.50-1.75% in water,ph:2.0-4.0 mixture of cmi and mi,2.5-3.5% in water,ph:2.5-5.0 4500-5500 cps(2% in h2o, 25°c) usp2910,2%粘度:15mpa.s,甲氧基:28-30%;羟丙基:7.0-12% usp2910,2%粘度:50mpa.s,甲氧基:28-30%;羟丙基:7.0-12% usp2910,2%粘度:3mpa.s,甲氧基:28-30%;羟丙基:7.0-12% ii型s,2%粘度:100000mpa.s ii型s,2%粘度:40000mpa.s ii型s,2%粘度:10000mpa.s viscosity 2600-5600m.pas, 2 % in h2o ii型s,2%粘度:2500mpa.s i型, 2% 粘度:5mpa.s ar,40 wt. % in h2o 电镜专用,2.5% in h2o,ph:7.2-7.4 电镜专用,4% ar,50% in h2o 高纯度医用级,50% in h2o 电镜专用,50% in h2o 照相级,50% in h2o 20 wt. % in ethanol spray reagent, 10% in ethanol 40 wt. % in h2o 60 wt. % in h2o 20wt.%inmethanol 20 wt. % in mixture of lower aliphatic alcohols and water, contains 34% water ~5% in a mixture of lower aliphatic alcohols and water 5 wt. % in mixture of lower aliphatic alcohols and water, contains 45% water 20 wt. % suspension in thf 20 wt. % 20-25% 乙醇溶液 20-30%sol 含20%-30%乙醇,球蛋白分离范围1×10³~1×10⁵;葡聚糖分离范围5×10²~4×10⁴ 含20%-30%乙醇,球蛋白分离范围5×10³~2.5×10⁵;葡聚糖分离范围1×10³~8×10⁴ 含20%-30%乙醇,球蛋白分离范围2×104~8×106;葡聚糖分离范围1×104~2×106 含20%-30%乙醇,球蛋白分离范围4×104~1×107;葡聚糖分离范围4×104 ~2×107 含20%-30%乙醇,球蛋白分离范围1×10⁴~1.5×10⁶;葡聚糖分离范围2×10³~4×10⁵ gc≥95% 200nm,99% 分析对照品, ≥99.5%(hplc) 200μg/ml基质:水.u=1% 200目,99.99% ≥95%,10-40目,来源于果壳,椰壳 ≥95%,20-40目 20wt.%inh2o 22-25%aq. 25 wt. % in h2o, mkseal ar, 25%水溶液 ar,25%甲醇溶液 35 wt. % in h2o, mkseal 25 wt. % in hexanes 25 wt.% 水溶液 25 wt. % in h2o 25wt.%水溶液 电子级, 25%水溶液 超纯级, 25%水溶液, 用于痕量分析 25-28%, 蒸发残渣≤0.002% 25-28%, 蒸发残渣≤0.004% for lc-ms,≥25% in h2o ≥99.999% metals basis,28% in h2o 28-30% nh3 250μg/ml 基质:甲醇 u=3% 255μg/ml 基质:水 u=3% 25wt.% in d2o, 99 atom % d a solution in ethanol, ≥98% 3 n in d2o, 99.5 atom% d 99.5 atom % d, 3 n in d2o ≥28% nh3 in h2o,电子级 3-8%,10孔,1.5mm,玻璃板 3-8%,15孔,1.5mm,玻璃板 3.0 mg/ml 基质:二硫化碳 u=2% standard for gc,≥99.5% 3.175mm 直径 x 3.175mm 长, 99.9999% (metals basis) 3.175mm 直径 x 6.35mm 长, 99.95% (metals basis去除ta) 3.5mol/l(50wt.%)inthf ≥4.0 units/mg protein, 0.5-15.0 mg/ml in water, contains 0.1% thymol,过滤除菌 30 wt%甲醇溶液(ca. 5mol/l) 30 wt. % in h2o 35 wt. % in h2o ca. 28-32% in water ca. 30% in water 43-44%,m.w ~5000 30±2% in h2o 30-35% in  water 30-35%inwater 30-35% 35-39% 44-50% 50-54% 乙酰基含量13.5%, 丁酰基含量38% 乙酰基含量15.5%, 丁酰基含量35.5% 乙酰基含量3%, 丁酰基含量50% 乙酰基含量2%, 丁酰基含量52% 乙酰基含量2%, 丁酰基含量46% 30-38% 30-40 wt. % in d2o, 98 atom % d 30-50%(fe) 30.6-39.0%cu 30.6 - 39.0 %cu 300目,99.9% -22 目,99.998% metals basis 1.5mm 直径, 退火,99.995% metals basis 5mm (0.2in) 直径,99.995% (metals basis) 300目,99.995% 30nm 球形 纯度:99.5% trace metals basis <50 nm particle size (aps), ≥99.5% trace metals basis 30nm 球形 纯度>99.5% 30nm 球形 纯度≥97% trace metals basis 30nm 球形 纯度:99% trace metals basis 30nm 球形,99.5%,α型 30nm,98%,α型 20nm 球形,99.5%,γ型 150nm, 99.9%, α型 35-40%ir 31wt.% phthalyl hp-55s,邻苯二甲酰含量24% 33 wt.% solution in acetic acid, mkseal 33-35% tio2 35wt.% in h2o 36 wt. % in h2o 36.0-40.0% ru basis ≥37% ru basis gr,99.99% 37 wt. % in h2o 35-50 wt. % in h2o 38-42% aqueous solution 电泳级,≥99% acs, ≥99.0% 色谱级,≥99.0% (nt) 细胞与昆虫细胞培养级, ≥99% 分子生物学级,≥99.0% (nt) gr,99.0% 标准品,99.99% 适用于hplc,99.0-101.0% 5mm 直径,99.9999% metals basis 0.5mm 厚, 99.998% metals basis 0.5mm 直径, 99.998% metals basis 4-12%,11孔,1.0mm,塑料板 4-12%,15孔,1.0mm,塑料板 4-20%,11孔,1.0mm,塑料板 4-20%,15孔,1.0mm,塑料板 4.15mm厚, 99.99% metals basis 活性氧≥4.50% 4.5-6.5% (al) 4-6% al 4.5-6.5%(al) 40 wt. % in h2o (8.8 m) 40wt. % in h2o 40 wt.% in h2o 40 wt.% solution in meoh, mkseal 40 wt.% in h2o, mkseal ~25% in h2o ~10% in h2o ~25% in methanol ~40% in methanol 40 wt.% solution in methanol,mkseal ca. 40% in water ca. 35% in water c16: 30%, c18: 70% c18: 50% c18: 65% c18: 40% c18: 30%, c16: 70% 细胞培养级,≥99.5% (t) 40-50% in water ~40% in h2o 40-47%mgo 40-47% 40-50% 45.0 - 50.0% 40-60%,工业级 40.0 - 50.0 %甲醇溶液 43.2-47.6% methacrylic acid basis (calc. on dried substance) 44 wt. % in h2o 42-45%wt% in water br,50% 45-50% in water(stabilized with mehq) 45-50% 45-55 %(w/w) in h2o, ≥98 atom % 13c, ≥98%(cp) 4500mg/l 基质:水 u=1% 45wt.% aqueous solution 40-45% aqueous solution 约40%水溶液 48-50% in thf 48-50%溶液 48-50% ni basis,50μm 48-50% ni basis,150μm 48-50% ni basis,20-40mesh 48-50% ni basis 200-250目 48-50% ni basis,425-850um 48-50% ni basis,40μm 48-50% ni basis,60μm 49 wt. % in 2-ethylhexanoic acid 49wt.%in2-ethylhexanoicacid 30-35 wt. % in 200#paint solvent 49-53 wt. % in h2o 24-28 wt. % in h2o protein content≥90% ar,100% 偶联级,70%(标记率) 5+% 5-10%, for esterification 5-和6-异构体混合物 97%生物技术级 50 wt%己烷溶液 50 wt. % in h2o, 99% trace metals basis 50 wt. % in h2o, 99.9% trace metals basis ar,50 wt. % in h2o 5 wt. % in h2o 50 wt. % in mineral spirits nominally 50% in mineral spirits, fe 6% 50 wt. % in pentane 50 wt. % in propylene carbonate 50 wt. % in water 50 wt. % 水溶液 50 wt. %二氯甲烷溶液,含~280ppm对叔丁基邻苯二酚稳定剂 50 wt. %水溶液 50 wt.% in h2o ca. 50% in water ~50% ~50% w/w aq. br,70% 50+% 50-100 mesh, extent of labeling: 3-4 mmol/g loading, 1 % cross-linked br,60-80% 100-200 mesh, extent of labeling: 1.5-2.0 mmol/g loading, 1 % cross-linked 50-55% w/w hbf4 50-60%的水溶液 50-70% 500µg/ml, 1%hno3 500µg/ml, 5%hno3 红外测油仪专用, 99% standard for gc,≥99.6%(gc) 500μg/ml, 1% hno3 50nm,99% 300目,99% 99 atom % 13c, 98%(cp) 50wt%水溶液 50wt.% in h20 50wt.%inethanol 45-50%, soluble in isobutanol 55-60 wt% bf3 55-60% 55.0 - 58.0 % zn 57.5% ar,≥58% zn basis cp,70% 59-61% 6 wt. % (on silica gel) 60 wt. % 水溶液 60 wt. %水溶液 60 wt.% in h2o ≥80%(gc), 异构体混合物 dye content ≥60% (60% in water) cp,50-60% ar,60% 60-64% 60-65(%) 60-65% 60-70% 60.8 - 74.3 % tin 62 wt. % in h2o 含氟量≥60% 64-66%的水溶液 64-66% in water 65 wt. % in water 65 wt. % in h2o 65 wt. % in mineral spirits ~65% in h2o 65-75% in h2o 65+% 40 wt. % in methanol, contains (3-chloropropyl)trimethoxysilane 60 wt. % in methanol, contains (3-chloropropyl)trimethoxysilane hf 65% w/w 65-72% in water ≥85%(nt) 65wt% in h2o 68-70%, mixtures 60-70% 水溶液 68-72 % 68.0-72.0% in h2o 7-8 wt. % in methanol 7-9% 7.2-8.2 wt.% p2o5 p2o5 ca 7.5% w/w 70 wt. % in h2o 70 wt. % 正丙醇溶液 20 wt. % 正丙醇溶液 10 wt. % 正丙醇溶液 70 wt.% in 1-methoxy-2-propyl acetate 45-55% in water 活性氧: 4.0%-5.3% >70%(hplc) >70%(gc) 70-75% in water 70 wt. % in h2o 70-75% in heptane 70-75%inheptane 70.0±2.0% 分析对照品, ≥95%(t) >73%(gc) 73-79%(hplc) 73-79% 高纯,73% 74-76% in water ~75% in h2o 75 wt. % in h2o,含 600 ppm mehq 阻聚剂 75 wt. % in h2o 75 wt.% in h2o 75 wt. % in isopropanol uv≥98% >75%(gc)(stabilized with mgo) >75%(hplc) purity≥95% c18≥90% gymnemic acids≥75% ~75%(al) ~70% (al),ar 75+% 75-80%aq.soln. 75-80 wt. % in water ≥99.8%(gc) 78-83% 8 wt. % in h2o 8-20%,15孔,1.0mm,塑料板 80 wt. % 70 wt. % 80 wt. %正丁醇溶液 40 wt. %正丁醇溶液 20 wt. %正丁醇溶液 约75%于水中 ca.80% in water >80.0% 80-85%(contains varying amounts of tetrahydrofuran) ≥80%(isomers mixture ≥80%(isomers mixture) tech. 80%, stab. with calcium carbonate 高纯,70% hplc≥98%(异构体混合物) 蛋白质≥40% br,80% fmp,80% ind,dye content 80% mix>70% standard for gc ,≥99.5%(gc) 分析对照品, ≥99%(gc) uv≥80% br,40%,大豆 br,85%,地灵 超纯,80% ≥60%(hplc), 45-60 mg/ml in h2o ≥90%(hplc), 50mg/ml in h2o 80 wt. % in h2o, contains 600 ppm monomethyl ether hydroquinone as inhibitor 80 wt. % in h2o 80-85 % 80-85% 80nm,99.5% metals basis 800nm 球形 纯度>99.5% 80nm, 99.5% metals basis 80wt.% in isopropanol >83%(gc) 分析对照品, ≥99%(uv) ≥85%(gc) 85+% 高纯,95%(hplc) tech85% >85%(hplc)(t) ~85% for spectrophotometric det. of transition metals, ≥95% lyophilized powder,for cell culture,≥85% tech-85% ≥65% 细胞培养级,85% ≥85%(t) 65+% in water ≥85%(hplc),用于荧光分析 85-90%,含150-200 ppm mehq稳定剂 85/38% 85/35% >87%(gc) ar,87% 40nm 球形,99.5% ≥88%(gc) >88%(gc) ≥88%(hplc) 9-11% 9.5mm 直径,99.97% metals basis 9.5mm 直径,99.999% metals basis ≥85.0% 异构体混合物, 40 wt. % in h2o contains ~0.006% hydroquinone as stabilizer, 90% >90%(gc)(t) >90%(hplc)(t) ≥90%(t) gc≥96% 超纯,90% fmp,75% br,85%,甘蔗渣 br,85%,玉米芯 for spectrophotometric det. of si, ≥95% gc≥90%,鉴别 br,90-95% ar,96% ≥55%(gc) ≥90% (tlc) active content >96% 70-80% ar,95% cp,95% hplc≥88% ar,80% ≥95%(gc)(t) 精致级,90%(hplc),自由酸 ≥97%,n ≥97.0%(t) 偶联级,90% 超纯,97% 适用于荧光, ≥90%(hplc) 高纯,90% 90 wt. % in denatured ethanol 90-95% ar,90.0% puriss., meets analytical specification of ph. eur., 80-82.5% bi basis (按干物质计算) ≥88%,contain inhibitor ≥92%(hplc) 30-35% in h2o ~34% in h2o ≥88% ≥97%(enaymatic) 92+% 92-94 % 92-94% br,93% 分析对照品, ≥98.5% 73~79% >94%(gc)(t) ≥94%(gc)(t) 0.50mg/ml u=2% 正己烷 94+% dye content 97 % 95 atom % 15n, 95% 95 atom % 6li 95 atom % d, 96% 95 atom % d, cp:98% 95 atom % d, cp:99% 95 atom % d 95 atom% ≥96%,含稳定剂mehq ≥85%, contains mehq as stabilizer ≥52% in water ≥95%, stabilized with mehq ≥95%(stabilized with tbc) ≥95%(tbc作为稳定剂) ≥62%(gc), 顺反混合物, 含≤38%的3-氯-1-丁烯 50 wt.% in water ≥98%,200 ppm monomethyl ether hydroquinone as inhibitor >90%(gc),含100 ppm 对叔丁基邻苯二酚稳定剂 >95%(gc)(n) >96%,vegfr抑制剂 分析对照品, 98.5% 100μg/ml,u=4%,基体:石油醚 ~35 wt. % in h2o 固含量35%,液体 固含量98%,粉末 ≥60% cis- and trans- mixture,≥95%(gc) gc≥94% ≥83% gc≥98%,含0.01% 柠檬酸稳定剂 gc≥97% matrix for fab-ms and liquid sims,≥98.5%(gc) ≥98%(hplc), 用于气相色谱/质谱的环状硼化剂 technical,90% 分析标准品,>99% ≥95.0%(gc), 含3-5%水作稳定剂 mixture of cis and trans, ≥97%(hplc) ≥99%(hplc), for γ-gt 含量98%;ee值98% 97.5-102.5% ≥98%, stabilized with n-nitrosodiisopropanolamine 85 % rh 14.91% 分析对照品, ≥97% technical, ≥80% usp级,95% ≥99.5%(hplc) 乳化型, 99% 特纯,95% ≥99%, 100mm 高纯,97% cp,65% purity≥99% ≥97%(t)(hplc) 无水,≥98% al≥8.4% analytical standard,99% ar,99%+ 分析对照品, 99.9% br,牛心,95% br,猪心,95% br,马心,95% dye content 95 % cp,56% dye content~95 % gc≥95%(sum of enantiomers) ≥95% (sum of enantiomers) hplc≥70% hplc≥95.5% mix95%(4:1) 高纯,98%(hplc) purum, ≥98.0% (tlc) sn 22.50%-24.50% 核磁共振定量标准,99.998% for hplc,>99.5% ar,99.8% standard for gc,≥99.9%(gc) strength 95-105% technical grade, ≥90% tlc≥95% total nitrogen 2.9 to 3.3 % zn 17.9-18.2% ≥50% ≥95%(hplc)(n) ≥95%(t&qnmr) ≥95%(电泳纯度,重组体,浓缩液) ≥95%,仪器校正 ≥95%,生物标记 活性氧≥15% ≥97.0%(gc) ≥97.0%(hplc) ≥98%, hplc ≥98%,kosher ≥99% sum of enantiomers 离子对色谱级, ≥99.0% (t) ipc,98% 分析对照品,99.5% 分析对照品,≥96% 分析对照品,≥97% ar, ≥96.0% 生物医用级,≥98%,β-phase basis,<70μm 生物医用级,≥98%,β-phase basis,< 30μm 生物医用级,≥98%,β-phase basis,< 0.2μm 生物医用级,≥98%,β-phase basis,< 0.1μm 生物医用级,≥98%,α-phase basis,< 70μm 生物医用级,≥98%,α-phase basis,< 30μm 生物医用级,≥98%,α-phase basis,<10μm 生物医用级,≥98%,α-phase basis,< 5um 活性物含量50% 激光级,95% 用于细胞培养,>96% 生物技术级,90% ≥95%, 用于生化研究 >78%(gc) ≥78% ≥97%(hplc)(t) ≥98%(gc), 顺反异构体混和物 technical, mixture of isomers(mainly the α-isomer), ≥90%(gc) ≥98%,用于dtnb硫醇定量 97.5-102.5%(with naoh, t) 超干级,99.9% metals basis 超干级, ≥98% mix95% ≥97%(tlc) ≥98.0%,for ion-pair chromatography 离子对色谱法,≥99.0% 分析对照品, 97% ≥95%, 天然提取, 异构体混合物 无水,99.99% metals basis 超干级, 99.99%(reo) 试剂级,98.5% 96 atom % d, 96% 96 atom % d, 98% (cp) ≥96%, rel-(1r-2e-pr)-equatorial gc≥99%,mixture of isomers mixture of isomers, ≥95% purum,≥98.0%(hplc),粉末,红棕色 ≥96.0% >96%(gc)(n) ≥52% 分析对照品,98%(hplc) purity≥96% standard for gc ,>99%(gc) 分析对照品, 99.5%(gc) standard for gc,≥98.0%(gc) 98.5+% 用于昆虫细胞培养,用于植物细胞培养, ≥96.0% fe>30.5% 高纯,90%(hplc) 酐:90%酸:10% ≥96%(t) ~20% apocarotenal basis (uv-vis), suspension (oily) ≥98.5%(hplc) 分析对照品, 99.5% 生物技术级,≥99% for plant cell culture,≥96% 分析对照品,≥98% (gc) 96~100% br,96-100% 含量98%;ee值99% 97 atom % 18o 10 atom % 18o 98atom%18o 97 atom% 18o 97 atom % d, 96% (cp) 97 atom % d,98% (cp) ≥97%, stabilized with mehq ≥96.5%(gc) mix>98% mix98% pd 5%,poisoned with lead hplc≥98%(mixture of cis and trans) mixture of isomers,97% technical grade, contains 1% hydroquinone as inhibitor 分析对照品, 99%(gc) ≥98%,含稳定剂tbc 用于环境分析.hplc≥98% gc≥95%(mixture of cis and trans) br,95%(mixture of cis and trans) 分析对照品, 97%(含水约40%) (单位重量以湿重计) >94.0%(hplc) >95% (lc-ms) >96.0%(hplc) >97% (hplc) >98%(gc) ≥98%, bioultra, from yeast purified by column chromatography, ≥99% >98.0%(lc),含≤5%己烷 (d, 99.5%) 40% in d2o (d, 99.5%) 30% in d2o (d4, 98%) ca. 8.5% in methanol 100-200 mesh,1%dvb 16.5 to 18.5% fe 3 wt.% 基体:丙二醇 10 wt.% 基体:丙二醇 55wt.% in isobutanol 药用级,95-105% 88.00-95.00 %(mixture of isomers) ca. 15% in water ≥93.0%(gc) dye content 75% mn 30% purity≥97% s: 13.5-15.5% 12.5-15.5% s 分析对照品, 99.8%

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